Buchanan, D.A., Fischetti, M.V., Dimaria, D.J. (1989) Coulombic and neutral electron trapping centers in SiO2. Applied Surface Science, 39. 420-428 doi:10.1016/0169-4332(89)90459-5
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Coulombic and neutral electron trapping centers in SiO2 | ||
Journal | Applied Surface Science | ||
Authors | Buchanan, D.A. | Author | |
Fischetti, M.V. | Author | ||
Dimaria, D.J. | Author | ||
Year | 1989 (October) | Volume | 39 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/0169-4332(89)90459-5Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9894823 | Long-form Identifier | mindat:1:5:9894823:3 |
GUID | 0 | ||
Full Reference | Buchanan, D.A., Fischetti, M.V., Dimaria, D.J. (1989) Coulombic and neutral electron trapping centers in SiO2. Applied Surface Science, 39. 420-428 doi:10.1016/0169-4332(89)90459-5 | ||
Plain Text | Buchanan, D.A., Fischetti, M.V., Dimaria, D.J. (1989) Coulombic and neutral electron trapping centers in SiO2. Applied Surface Science, 39. 420-428 doi:10.1016/0169-4332(89)90459-5 | ||
In | (n.d.) Applied Surface Science Vol. 39. Elsevier BV |
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