Reference Type | Journal (article/letter/editorial) |
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Title | Mechanism of alloy formation due to noble metal deposition on silicon surfaces at room temperature: Chemical bonding model |
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Journal | Applied Surface Science |
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Authors | Iwami, M. | Author |
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Kusaka, M. | Author |
Hirai, M. | Author |
Kubota, M. | Author |
Tochihara, H. | Author |
Murata, Y. | Author |
Year | 1990 (January) | Volume | 41 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/0169-4332(89)90039-1Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 9894909 | Long-form Identifier | mindat:1:5:9894909:2 |
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GUID | 0 |
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Full Reference | Iwami, M., Kusaka, M., Hirai, M., Kubota, M., Tochihara, H., Murata, Y. (1990) Mechanism of alloy formation due to noble metal deposition on silicon surfaces at room temperature: Chemical bonding model. Applied Surface Science, 41. 97-102 doi:10.1016/0169-4332(89)90039-1 |
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Plain Text | Iwami, M., Kusaka, M., Hirai, M., Kubota, M., Tochihara, H., Murata, Y. (1990) Mechanism of alloy formation due to noble metal deposition on silicon surfaces at room temperature: Chemical bonding model. Applied Surface Science, 41. 97-102 doi:10.1016/0169-4332(89)90039-1 |
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In | (n.d.) Applied Surface Science Vol. 41. Elsevier BV |
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