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Yoshida, I., Furukawa, H., Hirosawa, T., Nakao, M. (1994) Fabrication of CuO2-plane-based high-temperature superconducting thin films by atomic layer controlled molecular beam epitaxy. Applied Surface Science, 82. 501-506 doi:10.1016/0169-4332(94)90265-8

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Reference TypeJournal (article/letter/editorial)
TitleFabrication of CuO2-plane-based high-temperature superconducting thin films by atomic layer controlled molecular beam epitaxy
JournalApplied Surface Science
AuthorsYoshida, I.Author
Furukawa, H.Author
Hirosawa, T.Author
Nakao, M.Author
Year1994 (December)Volume82
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(94)90265-8Search in ResearchGate
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Mindat Ref. ID9897415Long-form Identifiermindat:1:5:9897415:9
GUID0
Full ReferenceYoshida, I., Furukawa, H., Hirosawa, T., Nakao, M. (1994) Fabrication of CuO2-plane-based high-temperature superconducting thin films by atomic layer controlled molecular beam epitaxy. Applied Surface Science, 82. 501-506 doi:10.1016/0169-4332(94)90265-8
Plain TextYoshida, I., Furukawa, H., Hirosawa, T., Nakao, M. (1994) Fabrication of CuO2-plane-based high-temperature superconducting thin films by atomic layer controlled molecular beam epitaxy. Applied Surface Science, 82. 501-506 doi:10.1016/0169-4332(94)90265-8
In(n.d.) Applied Surface Science Vol. 82. Elsevier BV

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Rautanen, J., Leskelä, M., Niinistö, L., Nykänen, E., Soininen, P., Utriainen, M. (1994) The effect of growth parameters on the deposition of CaS thin films by atomic layer epitaxy. Applied Surface Science, 82. 553-558 doi:10.1016/0169-4332(94)90274-7
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