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Nishimura, Yukio, Ujita, Hiroki, Tsuji, Masaharu (1995) Tantalum oxide film formation by excimer laser ablation. Applied Surface Science, 89. 393-399 doi:10.1016/0169-4332(95)00041-0

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Reference TypeJournal (article/letter/editorial)
TitleTantalum oxide film formation by excimer laser ablation
JournalApplied Surface Science
AuthorsNishimura, YukioAuthor
Ujita, HirokiAuthor
Tsuji, MasaharuAuthor
Year1995 (August)Volume89
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(95)00041-0Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9897773Long-form Identifiermindat:1:5:9897773:0
GUID0
Full ReferenceNishimura, Yukio, Ujita, Hiroki, Tsuji, Masaharu (1995) Tantalum oxide film formation by excimer laser ablation. Applied Surface Science, 89. 393-399 doi:10.1016/0169-4332(95)00041-0
Plain TextNishimura, Yukio, Ujita, Hiroki, Tsuji, Masaharu (1995) Tantalum oxide film formation by excimer laser ablation. Applied Surface Science, 89. 393-399 doi:10.1016/0169-4332(95)00041-0
In(n.d.) Applied Surface Science Vol. 89. Elsevier BV

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Nishimura, Yukio, Hiroki, Ujita, Ochiai, Terufumi, Tsuji, Masaharu (1994) Tantalum oxide film deposition by laser ablation. Applied Surface Science, 79. 165-170 doi:10.1016/0169-4332(94)90406-5
Nishimura, Yukio, Shinkawa, Akihiro, Ujita, Hiroki, Tsuji, Masaharu, Nakamura, Masafumi (1998) Deposition of tantalum oxide films by ArF excimer laser ablation. Applied Surface Science, 136. 22-28 doi:10.1016/s0169-4332(98)00332-8
Tsuji, Masaharu, Sakumoto, Minoru, Itoh, Naoki, Obase, Hiroshi, Nishimura, Yukio (1991) SiO2 film growth by ArF laser photolysis of SiH4/N2O mixtures. Applied Surface Science, 51. 171-176 doi:10.1016/0169-4332(91)90399-5
Tsuji, Masaharu, Itoh, Naoki, Nishimura, Yukio (1992) Deposition of SiO2Thin Films by Reactive Excimer Laser Ablation. Japanese Journal of Applied Physics, 31. 2536-2539 doi:10.1143/jjap.31.2536
Welsch, E., Ettrich, K., Blaschke, H., Kaiser, N. (1996) Excimer laser interaction with dielectric thin films. Applied Surface Science, 96. 393-398 doi:10.1016/0169-4332(95)00492-0
Dyer, P.E., Jackson, S.R., Key, P.H., Metheringham, W.J., Schmidt, M.J.J. (1996) Excimer laser ablation and film deposition of Ti:sapphire. Applied Surface Science, 96. 849-854 doi:10.1016/0169-4332(95)00565-x
Szörényi, T., Kántor, Z., Laude, L.D. (1995) Atypical characteristics of KrF excimer laser ablation of indium-tin oxide films. Applied Surface Science, 86. 219-222 doi:10.1016/0169-4332(94)00378-5
Ihlemann, J., Wolff-Rottke, B. (1995) Excimer laser ablation patterning of dielectric layers. Applied Surface Science, 86. 228-233 doi:10.1016/0169-4332(94)00416-1
Buck, M., Hess, P. (1989) Ablation of benzene from Van Der Waals films with excimer laser pulses at 248 nm. Applied Surface Science, 43. 358-362 doi:10.1016/0169-4332(89)90239-0
Ihlemann, J. (1992) Excimer laser ablation of fused silica. Applied Surface Science, 54. 193-200 doi:10.1016/0169-4332(92)90043-w
Jackson, S.R., Metheringham, W.J., Dyer, P.E. (1995) Excimer laser ablation of Nd: YAG and Nd: glass. Applied Surface Science, 86. 223-227 doi:10.1016/0169-4332(94)00415-3
 
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