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Kähler, J.D., Depta, D., Ferretti, R. (1995) Selective deposition of tungsten on ITM-CoSi2. Applied Surface Science, 91. 339-341 doi:10.1016/0169-4332(95)00141-7

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Reference TypeJournal (article/letter/editorial)
TitleSelective deposition of tungsten on ITM-CoSi2
JournalApplied Surface Science
AuthorsKähler, J.D.Author
Depta, D.Author
Ferretti, R.Author
Year1995 (October)Volume91
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(95)00141-7Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9897907Long-form Identifiermindat:1:5:9897907:5
GUID0
Full ReferenceKähler, J.D., Depta, D., Ferretti, R. (1995) Selective deposition of tungsten on ITM-CoSi2. Applied Surface Science, 91. 339-341 doi:10.1016/0169-4332(95)00141-7
Plain TextKähler, J.D., Depta, D., Ferretti, R. (1995) Selective deposition of tungsten on ITM-CoSi2. Applied Surface Science, 91. 339-341 doi:10.1016/0169-4332(95)00141-7
In(n.d.) Applied Surface Science Vol. 91. Elsevier BV

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Bär, E., Lorenz, J. (1995) 3D simulation of tungsten low-pressure chemical vapor deposition in contact holes. Applied Surface Science, 91. 321-325 doi:10.1016/0169-4332(95)00138-7
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Sanguinetti, Stefano, Calegari, Camilla, Miglio, Leo (1995) Phonon dispersion relations of metallic NiSi2 and CoSi2 by semi-empirical tight-binding calculation. Applied Surface Science, 91. 103-106 doi:10.1016/0169-4332(95)00103-4
 
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