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Patsalas, P, Charitidis, C, Logothetidis, S (2000) In situ and real-time ellipsometry monitoring of submicron titanium nitride/titanium silicide electronic devices. Applied Surface Science, 154. 256-262 doi:10.1016/s0169-4332(99)00444-4

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Reference TypeJournal (article/letter/editorial)
TitleIn situ and real-time ellipsometry monitoring of submicron titanium nitride/titanium silicide electronic devices
JournalApplied Surface Science
AuthorsPatsalas, PAuthor
Charitidis, CAuthor
Logothetidis, SAuthor
Year2000 (February)Volume154
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(99)00444-4Search in ResearchGate
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Mindat Ref. ID9901691Long-form Identifiermindat:1:5:9901691:1
GUID0
Full ReferencePatsalas, P, Charitidis, C, Logothetidis, S (2000) In situ and real-time ellipsometry monitoring of submicron titanium nitride/titanium silicide electronic devices. Applied Surface Science, 154. 256-262 doi:10.1016/s0169-4332(99)00444-4
Plain TextPatsalas, P, Charitidis, C, Logothetidis, S (2000) In situ and real-time ellipsometry monitoring of submicron titanium nitride/titanium silicide electronic devices. Applied Surface Science, 154. 256-262 doi:10.1016/s0169-4332(99)00444-4
In(n.d.) Applied Surface Science Vol. 154. Elsevier BV

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Logothetidis, S, Gioti, M, Charitidis, C, Patsalas, P, Arvanitidis, J, Stoemenos, J (1999) Stability, enhancement of elastic properties and structure of multilayered amorphous carbon films. Applied Surface Science, 138. 244-249 doi:10.1016/s0169-4332(98)00401-2
Patsalas, P., Charitidis, C., Logothetidis, S., Dimitriadis, C. A., Valassiades, O. (1999) Combined electrical and mechanical properties of titanium nitride thin films as metallization materials. Journal of Applied Physics, 86 (9). 5296-5298 doi:10.1063/1.371514
Patsalas, P., Logothetidis, S. (2001) Optical, electronic, and transport properties of nanocrystalline titanium nitride thin films. Journal of Applied Physics, 90 (9). 4725-4734 doi:10.1063/1.1403677
Patsalas, P., Gravalidis, C., Logothetidis, S. (2004) Surface kinetics and subplantation phenomena affecting the texture, morphology, stress, and growth evolution of titanium nitride films. Journal of Applied Physics, 96 (11). 6234-6246 doi:10.1063/1.1811389
Mantese, L, Selinidis, K, Wilson, P.T, Lim, D, Jiang, Y.Y, Ekerdt, J.G, Downer, M.C (2000) In situ control and monitoring of doped and compositionally graded SiGe films using spectroscopic ellipsometry and second harmonic generation. Applied Surface Science, 154. 229-237 doi:10.1016/s0169-4332(99)00386-4
Logothetidis, S, Patsalas, P, Charitidis, C (2003) Enhanced catalytic activity of nanostructured cerium oxide films. Materials Science and Engineering: C, 23. 803-806 doi:10.1016/j.msec.2003.09.081
Wang, L.D., Kwok, H.S. (2000) Cubic aluminum nitride and gallium nitride thin films prepared by pulsed laser deposition. Applied Surface Science, 154. 439-443 doi:10.1016/s0169-4332(99)00372-4
Halary, E, Benvenuti, G, Wagner, F, Hoffmann, P (2000) Light induced chemical vapour deposition of titanium oxide thin films at room temperature. Applied Surface Science, 154. 146-151 doi:10.1016/s0169-4332(99)00425-0
Logothetidis, S., Alexandrou, I., Stoemenos, J. (1995) In-situ spectroscopic ellipsometry to control the growth of Ti nitride and carbide thin films. Applied Surface Science, 86. 185-189 doi:10.1016/0169-4332(94)00392-0
Pinzari, F., Ascarelli, P., Cappelli, E., Giorgi, R., Turtù, S. (2000) On the surface acid–base properties of titanium sheets. Applied Surface Science, 156. 1-8 doi:10.1016/s0169-4332(99)00510-3
Southwell, R.P., Seebauer, E.G. (1997) Practical processing issues in titanium silicide CVD. Applied Surface Science, 119. 41-49 doi:10.1016/s0169-4332(97)00168-2
 
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