Senzaki, J, Fukuda, K, Imai, S, Tanaka, Y, Kobayashi, N, Tanoue, H, Okushi, H, Arai, K (2000) The post-annealing temperature dependences of electrical properties and surface morphologies for arsenic ion-implanted 4H-SiC at high temperature. Applied Surface Science, 159. 544-549 doi:10.1016/s0169-4332(00)00093-3
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | The post-annealing temperature dependences of electrical properties and surface morphologies for arsenic ion-implanted 4H-SiC at high temperature | ||
Journal | Applied Surface Science | ||
Authors | Senzaki, J | Author | |
Fukuda, K | Author | ||
Imai, S | Author | ||
Tanaka, Y | Author | ||
Kobayashi, N | Author | ||
Tanoue, H | Author | ||
Okushi, H | Author | ||
Arai, K | Author | ||
Year | 2000 (June) | Volume | 159 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/s0169-4332(00)00093-3Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9901933 | Long-form Identifier | mindat:1:5:9901933:4 |
GUID | 0 | ||
Full Reference | Senzaki, J, Fukuda, K, Imai, S, Tanaka, Y, Kobayashi, N, Tanoue, H, Okushi, H, Arai, K (2000) The post-annealing temperature dependences of electrical properties and surface morphologies for arsenic ion-implanted 4H-SiC at high temperature. Applied Surface Science, 159. 544-549 doi:10.1016/s0169-4332(00)00093-3 | ||
Plain Text | Senzaki, J, Fukuda, K, Imai, S, Tanaka, Y, Kobayashi, N, Tanoue, H, Okushi, H, Arai, K (2000) The post-annealing temperature dependences of electrical properties and surface morphologies for arsenic ion-implanted 4H-SiC at high temperature. Applied Surface Science, 159. 544-549 doi:10.1016/s0169-4332(00)00093-3 | ||
In | (n.d.) Applied Surface Science Vol. 159. Elsevier BV |
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