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Zheng, Daishun, Li, Hairong, Wang, Yanyong, Zhang, Fujia (2001) Surface and interface analysis of tris-(8-hydroxyquinoline) aluminum and indium–tin-oxide using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). Applied Surface Science, 183. 165-172 doi:10.1016/s0169-4332(01)00545-1

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Reference TypeJournal (article/letter/editorial)
TitleSurface and interface analysis of tris-(8-hydroxyquinoline) aluminum and indium–tin-oxide using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS)
JournalApplied Surface Science
AuthorsZheng, DaishunAuthor
Li, HairongAuthor
Wang, YanyongAuthor
Zhang, FujiaAuthor
Year2001 (November)Volume183
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(01)00545-1Search in ResearchGate
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Mindat Ref. ID9903265Long-form Identifiermindat:1:5:9903265:4
GUID0
Full ReferenceZheng, Daishun, Li, Hairong, Wang, Yanyong, Zhang, Fujia (2001) Surface and interface analysis of tris-(8-hydroxyquinoline) aluminum and indium–tin-oxide using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). Applied Surface Science, 183. 165-172 doi:10.1016/s0169-4332(01)00545-1
Plain TextZheng, Daishun, Li, Hairong, Wang, Yanyong, Zhang, Fujia (2001) Surface and interface analysis of tris-(8-hydroxyquinoline) aluminum and indium–tin-oxide using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). Applied Surface Science, 183. 165-172 doi:10.1016/s0169-4332(01)00545-1
In(n.d.) Applied Surface Science Vol. 183. Elsevier BV

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