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Yamaoka, Masanori, Murakami, Hideki, Miyazaki, Seiichi (2003) Diffusion and incorporation of Zr into thermally grown SiO2 on Si(1 0 0). Applied Surface Science, 216. 223-227 doi:10.1016/s0169-4332(03)00428-8

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Reference TypeJournal (article/letter/editorial)
TitleDiffusion and incorporation of Zr into thermally grown SiO2 on Si(1 0 0)
JournalApplied Surface Science
AuthorsYamaoka, MasanoriAuthor
Murakami, HidekiAuthor
Miyazaki, SeiichiAuthor
Year2003 (June)Volume216
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(03)00428-8Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9905284Long-form Identifiermindat:1:5:9905284:3
GUID0
Full ReferenceYamaoka, Masanori, Murakami, Hideki, Miyazaki, Seiichi (2003) Diffusion and incorporation of Zr into thermally grown SiO2 on Si(1 0 0). Applied Surface Science, 216. 223-227 doi:10.1016/s0169-4332(03)00428-8
Plain TextYamaoka, Masanori, Murakami, Hideki, Miyazaki, Seiichi (2003) Diffusion and incorporation of Zr into thermally grown SiO2 on Si(1 0 0). Applied Surface Science, 216. 223-227 doi:10.1016/s0169-4332(03)00428-8
In(n.d.) Applied Surface Science Vol. 216. Elsevier BV

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