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Wollschläger, Joachim, Bierkandt, Markus, Larsson, Mats I. (2003) Kinetic phase diagram for terrace and step nucleation of CaF/Si(111). Applied Surface Science, 219. 107-116 doi:10.1016/s0169-4332(03)00639-1

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Reference TypeJournal (article/letter/editorial)
TitleKinetic phase diagram for terrace and step nucleation of CaF/Si(111)
JournalApplied Surface Science
AuthorsWollschläger, JoachimAuthor
Bierkandt, MarkusAuthor
Larsson, Mats I.Author
Year2003 (October)Volume219
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(03)00639-1Search in ResearchGate
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Mindat Ref. ID9905478Long-form Identifiermindat:1:5:9905478:0
GUID0
Full ReferenceWollschläger, Joachim, Bierkandt, Markus, Larsson, Mats I. (2003) Kinetic phase diagram for terrace and step nucleation of CaF/Si(111). Applied Surface Science, 219. 107-116 doi:10.1016/s0169-4332(03)00639-1
Plain TextWollschläger, Joachim, Bierkandt, Markus, Larsson, Mats I. (2003) Kinetic phase diagram for terrace and step nucleation of CaF/Si(111). Applied Surface Science, 219. 107-116 doi:10.1016/s0169-4332(03)00639-1
In(n.d.) Applied Surface Science Vol. 219. Elsevier BV

See Also

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Wollschläger, Joachim, Pietsch, Holger, Klust, Andreas (1998) Competition between terrace and step nucleation: epitaxy of CaF2 on vicinal Si(111) studied by atomic force microscopy. Applied Surface Science, 130. 29-35 doi:10.1016/s0169-4332(98)00020-8
Wollschläger, Joachim, Klust, Andreas, Pietsch, Holger (1998) Inhomogeneous growth of CaF2 adlayers on Si(111) at intermediate temperatures. Applied Surface Science, 123. 496-500 doi:10.1016/s0169-4332(97)00552-7
Watanabe, Takanobu, Ohdomari, Iwao (2000) Modeling of a SiO2/Si(001) structure including step and terrace configurations. Applied Surface Science, 162. 116-121 doi:10.1016/s0169-4332(00)00179-3
(2003) Editorial Board. Applied Surface Science, 219. doi:10.1016/s0169-4332(03)00987-5
(2003) Author Index. Applied Surface Science, 219. doi:10.1016/s0169-4332(03)00992-9
(2003) Subject Index. Applied Surface Science, 219. doi:10.1016/s0169-4332(03)00993-0
(2003) Author Index. Applied Surface Science, 219. doi:10.1016/s0169-4332(03)01032-8
(2003) Subject Index. Applied Surface Science, 219. doi:10.1016/s0169-4332(03)01033-x
Wollschläger, Joachim, Meier, Andreas (1996) Diffraction spot profile analysis for heteroepitaxial surfaces applied to the initial growth stages of CaF2 adlayers on Si(111). Applied Surface Science, 104. 392-401 doi:10.1016/s0169-4332(96)00177-8
Bozzolo, G, Farı́as, D (2003) Preface. Applied Surface Science, 219. doi:10.1016/s0169-4332(03)00599-3
Larsson, Mats I., Tringides, Michael, Frischat, Hannes, Wollschläger, Joachim (1997) Thermal roughening of uncorrelated steps. Surface Science, 387 (1). 142-151 doi:10.1016/s0039-6028(97)00277-x
 
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