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Park, Nam Kyun, Kang, Dong Kyun, Kim, Byong-Ho, Jo, Sang Jin, Ha, Jeong Sook (2006) Electrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition. Applied Surface Science, 252. 8506-8509 doi:10.1016/j.apsusc.2005.11.064

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Reference TypeJournal (article/letter/editorial)
TitleElectrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition
JournalApplied Surface Science
AuthorsPark, Nam KyunAuthor
Kang, Dong KyunAuthor
Kim, Byong-HoAuthor
Jo, Sang JinAuthor
Ha, Jeong SookAuthor
Year2006 (October)Volume252
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2005.11.064Search in ResearchGate
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Mindat Ref. ID9908844Long-form Identifiermindat:1:5:9908844:0
GUID0
Full ReferencePark, Nam Kyun, Kang, Dong Kyun, Kim, Byong-Ho, Jo, Sang Jin, Ha, Jeong Sook (2006) Electrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition. Applied Surface Science, 252. 8506-8509 doi:10.1016/j.apsusc.2005.11.064
Plain TextPark, Nam Kyun, Kang, Dong Kyun, Kim, Byong-Ho, Jo, Sang Jin, Ha, Jeong Sook (2006) Electrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition. Applied Surface Science, 252. 8506-8509 doi:10.1016/j.apsusc.2005.11.064
In(n.d.) Applied Surface Science Vol. 252. Elsevier BV

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