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Li, W.L., Fei, W.D., Hanabusa, T. (2006) Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation. Applied Surface Science, 252. 2847-2852 doi:10.1016/j.apsusc.2005.04.043

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Reference TypeJournal (article/letter/editorial)
TitleEffect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation
JournalApplied Surface Science
AuthorsLi, W.L.Author
Fei, W.D.Author
Hanabusa, T.Author
Year2006 (February)Volume252
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2005.04.043Search in ResearchGate
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Mindat Ref. ID9909199Long-form Identifiermindat:1:5:9909199:4
GUID0
Full ReferenceLi, W.L., Fei, W.D., Hanabusa, T. (2006) Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation. Applied Surface Science, 252. 2847-2852 doi:10.1016/j.apsusc.2005.04.043
Plain TextLi, W.L., Fei, W.D., Hanabusa, T. (2006) Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation. Applied Surface Science, 252. 2847-2852 doi:10.1016/j.apsusc.2005.04.043
In(n.d.) Applied Surface Science Vol. 252. Elsevier BV

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