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Sharma, A., Tripathi, S., Shripathi, T. (2009) X-ray photoelectron study of annealed Co thin film on Si surface. Applied Surface Science, 256. 530-535 doi:10.1016/j.apsusc.2009.08.007

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Reference TypeJournal (article/letter/editorial)
TitleX-ray photoelectron study of annealed Co thin film on Si surface
JournalApplied Surface Science
AuthorsSharma, A.Author
Tripathi, S.Author
Shripathi, T.Author
Year2009 (October)Volume256
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2009.08.007Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9914812Long-form Identifiermindat:1:5:9914812:2
GUID0
Full ReferenceSharma, A., Tripathi, S., Shripathi, T. (2009) X-ray photoelectron study of annealed Co thin film on Si surface. Applied Surface Science, 256. 530-535 doi:10.1016/j.apsusc.2009.08.007
Plain TextSharma, A., Tripathi, S., Shripathi, T. (2009) X-ray photoelectron study of annealed Co thin film on Si surface. Applied Surface Science, 256. 530-535 doi:10.1016/j.apsusc.2009.08.007
In(n.d.) Applied Surface Science Vol. 256. Elsevier BV

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