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Nair, Prabitha B., Justinvictor, V.B., Daniel, Georgi P., Joy, K., Ramakrishnan, V., Thomas, P.V. (2011) Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering. Applied Surface Science, 257. 10869-10875 doi:10.1016/j.apsusc.2011.07.125

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Reference TypeJournal (article/letter/editorial)
TitleEffect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering
JournalApplied Surface Science
AuthorsNair, Prabitha B.Author
Justinvictor, V.B.Author
Daniel, Georgi P.Author
Joy, K.Author
Ramakrishnan, V.Author
Thomas, P.V.Author
Year2011 (October)Volume257
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2011.07.125Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9916779Long-form Identifiermindat:1:5:9916779:2
GUID0
Full ReferenceNair, Prabitha B., Justinvictor, V.B., Daniel, Georgi P., Joy, K., Ramakrishnan, V., Thomas, P.V. (2011) Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering. Applied Surface Science, 257. 10869-10875 doi:10.1016/j.apsusc.2011.07.125
Plain TextNair, Prabitha B., Justinvictor, V.B., Daniel, Georgi P., Joy, K., Ramakrishnan, V., Thomas, P.V. (2011) Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering. Applied Surface Science, 257. 10869-10875 doi:10.1016/j.apsusc.2011.07.125
In(n.d.) Applied Surface Science Vol. 257. Elsevier BV


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