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Wang, H., Wu, P., Li, X.F., Chen, S., Zhang, S.P., Song, B.B. (2011) Study of reactions between HfO2 and Si in thin films with precise identification of chemical states by XPS. Applied Surface Science, 257. 3440-3445 doi:10.1016/j.apsusc.2010.11.042

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Reference TypeJournal (article/letter/editorial)
TitleStudy of reactions between HfO2 and Si in thin films with precise identification of chemical states by XPS
JournalApplied Surface Science
AuthorsWang, H.Author
Wu, P.Author
Li, X.F.Author
Chen, S.Author
Zhang, S.P.Author
Song, B.B.Author
Year2011 (February)Volume257
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2010.11.042Search in ResearchGate
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Mindat Ref. ID9917263Long-form Identifiermindat:1:5:9917263:3
GUID0
Full ReferenceWang, H., Wu, P., Li, X.F., Chen, S., Zhang, S.P., Song, B.B. (2011) Study of reactions between HfO2 and Si in thin films with precise identification of chemical states by XPS. Applied Surface Science, 257. 3440-3445 doi:10.1016/j.apsusc.2010.11.042
Plain TextWang, H., Wu, P., Li, X.F., Chen, S., Zhang, S.P., Song, B.B. (2011) Study of reactions between HfO2 and Si in thin films with precise identification of chemical states by XPS. Applied Surface Science, 257. 3440-3445 doi:10.1016/j.apsusc.2010.11.042
In(n.d.) Applied Surface Science Vol. 257. Elsevier BV

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