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Lin, Tien-Chai, Huang, Wen-Chang, Liu, Chin-Hung, Chang, Shy-Chou (2012) Structural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering. Applied Surface Science, 258. 3302-3308 doi:10.1016/j.apsusc.2011.11.086

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Reference TypeJournal (article/letter/editorial)
TitleStructural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering
JournalApplied Surface Science
AuthorsLin, Tien-ChaiAuthor
Huang, Wen-ChangAuthor
Liu, Chin-HungAuthor
Chang, Shy-ChouAuthor
Year2012 (January)Volume258
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2011.11.086Search in ResearchGate
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Mindat Ref. ID9918966Long-form Identifiermindat:1:5:9918966:0
GUID0
Full ReferenceLin, Tien-Chai, Huang, Wen-Chang, Liu, Chin-Hung, Chang, Shy-Chou (2012) Structural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering. Applied Surface Science, 258. 3302-3308 doi:10.1016/j.apsusc.2011.11.086
Plain TextLin, Tien-Chai, Huang, Wen-Chang, Liu, Chin-Hung, Chang, Shy-Chou (2012) Structural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering. Applied Surface Science, 258. 3302-3308 doi:10.1016/j.apsusc.2011.11.086
In(n.d.) Applied Surface Science Vol. 258. Elsevier BV

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