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Zoethout, E., Louis, E., Bijkerk, F. (2013) Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films. Applied Surface Science, 285. 293-299 doi:10.1016/j.apsusc.2013.08.053

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Reference TypeJournal (article/letter/editorial)
TitleReal-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films
JournalApplied Surface Science
AuthorsZoethout, E.Author
Louis, E.Author
Bijkerk, F.Author
Year2013 (November)Volume285
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2013.08.053Search in ResearchGate
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Mindat Ref. ID9921568Long-form Identifiermindat:1:5:9921568:2
GUID0
Full ReferenceZoethout, E., Louis, E., Bijkerk, F. (2013) Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films. Applied Surface Science, 285. 293-299 doi:10.1016/j.apsusc.2013.08.053
Plain TextZoethout, E., Louis, E., Bijkerk, F. (2013) Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films. Applied Surface Science, 285. 293-299 doi:10.1016/j.apsusc.2013.08.053
In(n.d.) Applied Surface Science Vol. 285. Elsevier BV

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