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Ishii, Akihiro, Nakamura, Yoko, Oikawa, Itaru, Kamegawa, Atsunori, Takamura, Hitoshi (2015) Low-temperature preparation of high-n TiO2 thin film on glass by pulsed laser deposition. Applied Surface Science, 347. 528-534 doi:10.1016/j.apsusc.2015.04.125

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Reference TypeJournal (article/letter/editorial)
TitleLow-temperature preparation of high-n TiO2 thin film on glass by pulsed laser deposition
JournalApplied Surface Science
AuthorsIshii, AkihiroAuthor
Nakamura, YokoAuthor
Oikawa, ItaruAuthor
Kamegawa, AtsunoriAuthor
Takamura, HitoshiAuthor
Year2015 (August)Volume347
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2015.04.125Search in ResearchGate
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Mindat Ref. ID9925594Long-form Identifiermindat:1:5:9925594:5
GUID0
Full ReferenceIshii, Akihiro, Nakamura, Yoko, Oikawa, Itaru, Kamegawa, Atsunori, Takamura, Hitoshi (2015) Low-temperature preparation of high-n TiO2 thin film on glass by pulsed laser deposition. Applied Surface Science, 347. 528-534 doi:10.1016/j.apsusc.2015.04.125
Plain TextIshii, Akihiro, Nakamura, Yoko, Oikawa, Itaru, Kamegawa, Atsunori, Takamura, Hitoshi (2015) Low-temperature preparation of high-n TiO2 thin film on glass by pulsed laser deposition. Applied Surface Science, 347. 528-534 doi:10.1016/j.apsusc.2015.04.125
In(n.d.) Applied Surface Science Vol. 347. Elsevier BV

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