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Ishii, Akihiro, Kobayashi, Kosei, Oikawa, Itaru, Kamegawa, Atsunori, Imura, Masaaki, Kanai, Toshimasa, Takamura, Hitoshi (2017) Low-temperature preparation of rutile-type TiO 2 thin films for optical coatings by aluminum doping. Applied Surface Science, 412. 223-229 doi:10.1016/j.apsusc.2017.03.253

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Reference TypeJournal (article/letter/editorial)
TitleLow-temperature preparation of rutile-type TiO 2 thin films for optical coatings by aluminum doping
JournalApplied Surface Science
AuthorsIshii, AkihiroAuthor
Kobayashi, KoseiAuthor
Oikawa, ItaruAuthor
Kamegawa, AtsunoriAuthor
Imura, MasaakiAuthor
Kanai, ToshimasaAuthor
Takamura, HitoshiAuthor
Year2017 (August)Volume412
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2017.03.253Search in ResearchGate
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Mindat Ref. ID9930892Long-form Identifiermindat:1:5:9930892:8
GUID0
Full ReferenceIshii, Akihiro, Kobayashi, Kosei, Oikawa, Itaru, Kamegawa, Atsunori, Imura, Masaaki, Kanai, Toshimasa, Takamura, Hitoshi (2017) Low-temperature preparation of rutile-type TiO 2 thin films for optical coatings by aluminum doping. Applied Surface Science, 412. 223-229 doi:10.1016/j.apsusc.2017.03.253
Plain TextIshii, Akihiro, Kobayashi, Kosei, Oikawa, Itaru, Kamegawa, Atsunori, Imura, Masaaki, Kanai, Toshimasa, Takamura, Hitoshi (2017) Low-temperature preparation of rutile-type TiO 2 thin films for optical coatings by aluminum doping. Applied Surface Science, 412. 223-229 doi:10.1016/j.apsusc.2017.03.253
In(n.d.) Applied Surface Science Vol. 412. Elsevier BV

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