Liu, Kai, Ren, Xiao-min, Huang, Yong-qing, Cai, Shi-wei, Duan, Xiao-feng, Wang, Qi, Kang, Chao, Li, Jun-shuai, Chen, Qing-tao, Fei, Jia-rui (2015) Inductively coupled plasma etching of GaAs in Cl 2 /Ar, Cl 2 /Ar/O 2 chemistries with photoresist mask. Applied Surface Science, 356. 776-779 doi:10.1016/j.apsusc.2015.08.022
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Inductively coupled plasma etching of GaAs in Cl 2 /Ar, Cl 2 /Ar/O 2 chemistries with photoresist mask | ||
| Journal | Applied Surface Science | ||
| Authors | Liu, Kai | Author | |
| Ren, Xiao-min | Author | ||
| Huang, Yong-qing | Author | ||
| Cai, Shi-wei | Author | ||
| Duan, Xiao-feng | Author | ||
| Wang, Qi | Author | ||
| Kang, Chao | Author | ||
| Li, Jun-shuai | Author | ||
| Chen, Qing-tao | Author | ||
| Fei, Jia-rui | Author | ||
| Year | 2015 (November) | Volume | 356 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/j.apsusc.2015.08.022Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 9926467 | Long-form Identifier | mindat:1:5:9926467:9 |
| GUID | 0 | ||
| Full Reference | Liu, Kai, Ren, Xiao-min, Huang, Yong-qing, Cai, Shi-wei, Duan, Xiao-feng, Wang, Qi, Kang, Chao, Li, Jun-shuai, Chen, Qing-tao, Fei, Jia-rui (2015) Inductively coupled plasma etching of GaAs in Cl 2 /Ar, Cl 2 /Ar/O 2 chemistries with photoresist mask. Applied Surface Science, 356. 776-779 doi:10.1016/j.apsusc.2015.08.022 | ||
| Plain Text | Liu, Kai, Ren, Xiao-min, Huang, Yong-qing, Cai, Shi-wei, Duan, Xiao-feng, Wang, Qi, Kang, Chao, Li, Jun-shuai, Chen, Qing-tao, Fei, Jia-rui (2015) Inductively coupled plasma etching of GaAs in Cl 2 /Ar, Cl 2 /Ar/O 2 chemistries with photoresist mask. Applied Surface Science, 356. 776-779 doi:10.1016/j.apsusc.2015.08.022 | ||
| In | (n.d.) Applied Surface Science Vol. 356. Elsevier BV | ||
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