Chang, M.L., Wang, L.C., Lin, H.C., Chen, M.J., Lin, K.M. (2015) Investigation of defects in ultra-thin Al2O3 films deposited on pure copper by the atomic layer deposition technique. Applied Surface Science, 359. 533-542 doi:10.1016/j.apsusc.2015.10.144
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Investigation of defects in ultra-thin Al2O3 films deposited on pure copper by the atomic layer deposition technique | ||
| Journal | Applied Surface Science | ||
| Authors | Chang, M.L. | Author | |
| Wang, L.C. | Author | ||
| Lin, H.C. | Author | ||
| Chen, M.J. | Author | ||
| Lin, K.M. | Author | ||
| Year | 2015 (December) | Volume | 359 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/j.apsusc.2015.10.144Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 9927100 | Long-form Identifier | mindat:1:5:9927100:4 |
| GUID | 0 | ||
| Full Reference | Chang, M.L., Wang, L.C., Lin, H.C., Chen, M.J., Lin, K.M. (2015) Investigation of defects in ultra-thin Al2O3 films deposited on pure copper by the atomic layer deposition technique. Applied Surface Science, 359. 533-542 doi:10.1016/j.apsusc.2015.10.144 | ||
| Plain Text | Chang, M.L., Wang, L.C., Lin, H.C., Chen, M.J., Lin, K.M. (2015) Investigation of defects in ultra-thin Al2O3 films deposited on pure copper by the atomic layer deposition technique. Applied Surface Science, 359. 533-542 doi:10.1016/j.apsusc.2015.10.144 | ||
| In | (n.d.) Applied Surface Science Vol. 359. Elsevier BV | ||
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