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He, Yisong, Ye, Chao, Wang, Xiangying, Gao, Mingwei, Guo, Jiaming, Yang, Peifang (2016) Structural properties and preparation of Si-rich Si1−xCx thin films by radio-frequency magnetron sputtering. Applied Surface Science, 363. 477-482 doi:10.1016/j.apsusc.2015.12.097

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Reference TypeJournal (article/letter/editorial)
TitleStructural properties and preparation of Si-rich Si1−xCx thin films by radio-frequency magnetron sputtering
JournalApplied Surface Science
AuthorsHe, YisongAuthor
Ye, ChaoAuthor
Wang, XiangyingAuthor
Gao, MingweiAuthor
Guo, JiamingAuthor
Yang, PeifangAuthor
Year2016 (February)Volume363
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2015.12.097Search in ResearchGate
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Mindat Ref. ID9927483Long-form Identifiermindat:1:5:9927483:4
GUID0
Full ReferenceHe, Yisong, Ye, Chao, Wang, Xiangying, Gao, Mingwei, Guo, Jiaming, Yang, Peifang (2016) Structural properties and preparation of Si-rich Si1−xCx thin films by radio-frequency magnetron sputtering. Applied Surface Science, 363. 477-482 doi:10.1016/j.apsusc.2015.12.097
Plain TextHe, Yisong, Ye, Chao, Wang, Xiangying, Gao, Mingwei, Guo, Jiaming, Yang, Peifang (2016) Structural properties and preparation of Si-rich Si1−xCx thin films by radio-frequency magnetron sputtering. Applied Surface Science, 363. 477-482 doi:10.1016/j.apsusc.2015.12.097
In(n.d.) Applied Surface Science Vol. 363. Elsevier BV

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