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Sultana, Jenifar, Paul, Somdatta, Karmakar, Anupam, Yi, Ren, Dalapati, Goutam Kumar, Chattopadhyay, Sanatan (2017) Chemical bath deposited (CBD) CuO thin films on n-silicon substrate for electronic and optical applications: Impact of growth time. Applied Surface Science, 418. 380-387 doi:10.1016/j.apsusc.2016.12.139

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Reference TypeJournal (article/letter/editorial)
TitleChemical bath deposited (CBD) CuO thin films on n-silicon substrate for electronic and optical applications: Impact of growth time
JournalApplied Surface Science
AuthorsSultana, JenifarAuthor
Paul, SomdattaAuthor
Karmakar, AnupamAuthor
Yi, RenAuthor
Dalapati, Goutam KumarAuthor
Chattopadhyay, SanatanAuthor
Year2017 (October)Volume418
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2016.12.139Search in ResearchGate
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Mindat Ref. ID9931257Long-form Identifiermindat:1:5:9931257:8
GUID0
Full ReferenceSultana, Jenifar, Paul, Somdatta, Karmakar, Anupam, Yi, Ren, Dalapati, Goutam Kumar, Chattopadhyay, Sanatan (2017) Chemical bath deposited (CBD) CuO thin films on n-silicon substrate for electronic and optical applications: Impact of growth time. Applied Surface Science, 418. 380-387 doi:10.1016/j.apsusc.2016.12.139
Plain TextSultana, Jenifar, Paul, Somdatta, Karmakar, Anupam, Yi, Ren, Dalapati, Goutam Kumar, Chattopadhyay, Sanatan (2017) Chemical bath deposited (CBD) CuO thin films on n-silicon substrate for electronic and optical applications: Impact of growth time. Applied Surface Science, 418. 380-387 doi:10.1016/j.apsusc.2016.12.139
In(n.d.) Applied Surface Science Vol. 418. Elsevier BV

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