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Wang, Mengying, Thimont, Yohann, Presmanes, Lionel, Diao, Xungang, Barnabé, Antoine (2017) The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films. Applied Surface Science, 419. 795-801 doi:10.1016/j.apsusc.2017.05.095

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Reference TypeJournal (article/letter/editorial)
TitleThe effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films
JournalApplied Surface Science
AuthorsWang, MengyingAuthor
Thimont, YohannAuthor
Presmanes, LionelAuthor
Diao, XungangAuthor
Barnabé, AntoineAuthor
Year2017 (October)Volume419
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2017.05.095Search in ResearchGate
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Mindat Ref. ID9931409Long-form Identifiermindat:1:5:9931409:9
GUID0
Full ReferenceWang, Mengying, Thimont, Yohann, Presmanes, Lionel, Diao, Xungang, Barnabé, Antoine (2017) The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films. Applied Surface Science, 419. 795-801 doi:10.1016/j.apsusc.2017.05.095
Plain TextWang, Mengying, Thimont, Yohann, Presmanes, Lionel, Diao, Xungang, Barnabé, Antoine (2017) The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films. Applied Surface Science, 419. 795-801 doi:10.1016/j.apsusc.2017.05.095
In(n.d.) Applied Surface Science Vol. 419. Elsevier BV

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