Minami, Masaki, Tomiya, Shigetaka, Ishikawa, Kenji, Matsumoto, Ryosuke, Chen, Shang, Fukasawa, Masanaga, Uesawa, Fumikatsu, Sekine, Makoto, Hori, Masaru, Tatsumi, Tetsuya (2011) Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma. Japanese Journal of Applied Physics, 50 (8) 8 doi:10.7567/jjap.50.08je03
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Minami, Masaki | Author | |
| Tomiya, Shigetaka | Author | ||
| Ishikawa, Kenji | Author | ||
| Matsumoto, Ryosuke | Author | ||
| Chen, Shang | Author | ||
| Fukasawa, Masanaga | Author | ||
| Uesawa, Fumikatsu | Author | ||
| Sekine, Makoto | Author | ||
| Hori, Masaru | Author | ||
| Tatsumi, Tetsuya | Author | ||
| Year | 2011 (August 1) | Volume | 50 |
| Issue | 8 | ||
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.7567/jjap.50.08je03Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15039461 | Long-form Identifier | mindat:1:5:15039461:9 |
| GUID | 0 | ||
| Full Reference | Minami, Masaki, Tomiya, Shigetaka, Ishikawa, Kenji, Matsumoto, Ryosuke, Chen, Shang, Fukasawa, Masanaga, Uesawa, Fumikatsu, Sekine, Makoto, Hori, Masaru, Tatsumi, Tetsuya (2011) Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma. Japanese Journal of Applied Physics, 50 (8) 8 doi:10.7567/jjap.50.08je03 | ||
| Plain Text | Minami, Masaki, Tomiya, Shigetaka, Ishikawa, Kenji, Matsumoto, Ryosuke, Chen, Shang, Fukasawa, Masanaga, Uesawa, Fumikatsu, Sekine, Makoto, Hori, Masaru, Tatsumi, Tetsuya (2011) Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma. Japanese Journal of Applied Physics, 50 (8) 8 doi:10.7567/jjap.50.08je03 | ||
| In | (2011, August) Japanese Journal of Applied Physics Vol. 50 (8) Japan Society of Applied Physics | ||
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