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Kao, Chyuan-Haur, Chen, Hsiang (2012) Ta2O5Polycrystalline Silicon Capacitors with CF4Plasma Treatment. Japanese Journal of Applied Physics, 51 (4) 41502 doi:10.7567/jjap.51.041502

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Reference TypeJournal (article/letter/editorial)
TitleTa2O5Polycrystalline Silicon Capacitors with CF4Plasma Treatment
JournalJapanese Journal of Applied Physics
AuthorsKao, Chyuan-HaurAuthor
Chen, HsiangAuthor
Year2012 (April 1)Volume51
Issue4
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.51.041502Search in ResearchGate
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Mindat Ref. ID15042462Long-form Identifiermindat:1:5:15042462:0
GUID0
Full ReferenceKao, Chyuan-Haur, Chen, Hsiang (2012) Ta2O5Polycrystalline Silicon Capacitors with CF4Plasma Treatment. Japanese Journal of Applied Physics, 51 (4) 41502 doi:10.7567/jjap.51.041502
Plain TextKao, Chyuan-Haur, Chen, Hsiang (2012) Ta2O5Polycrystalline Silicon Capacitors with CF4Plasma Treatment. Japanese Journal of Applied Physics, 51 (4) 41502 doi:10.7567/jjap.51.041502
In(2012, April) Japanese Journal of Applied Physics Vol. 51 (4) Japan Society of Applied Physics

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Kao, Chyuan-Haur, Chen, Hsiang (2012) Ta$_{2}$O$_{5}$ Polycrystalline Silicon Capacitors with CF$_{4}$ Plasma Treatment. Japanese Journal of Applied Physics, 51. 41502 doi:10.1143/jjap.51.041502
Wang, Jer-Chyi, Lu, Tseng-Fu, Shih, Hui-Yu, Yang, Chia-Ming, Lai, Chao-Sung, Kao, Chyuan-Haur, Pan, Tung-Ming (2011) Reference Electrode–Insulator–Nitride–Oxide–Semiconductor Structure with Sm2O3Sensing Membrane for pH-Sensor Application. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.7567/jjap.50.04dl09
Kao, Chyuan-Haur, Chen, Hsiang, Chiu, Jing Sing, Chen, Kung Shao, Pan, Yu Tsung (2010) Physical and electrical characteristics of the high-k Ta2O5 (tantalum pentoxide) dielectric deposited on the polycrystalline silicon. Applied Physics Letters, 96 (11). 112901pp. doi:10.1063/1.3334725
Wang, Jer-Chyi, Lu, Tseng-Fu, Shih, Hui-Yu, Yang, Chia-Ming, Lai, Chao-Sung, Kao, Chyuan-Haur, Pan, Tung-Ming (2011) pH Sensing Characterization of Programmable Sm2O3/Si3N4/SiO2/Si Electrolyte–Insulator–Semiconductor Sensor with Rapid Thermal Annealing. Japanese Journal of Applied Physics, 50 (10) 10 doi:10.7567/jjap.50.10pg04
Su, Peng-Yin, Chuang, Ricky-Wenkuei, Chen, Chin-Hsiang, Kao, Tsung-Hsien (2015) Low-frequency noise properties of metal–organic–metal ultraviolet sensors. Japanese Journal of Applied Physics, 54 (4) 4 doi:10.7567/jjap.54.04dk12
Shih, Ming Chang, Kao, Yi Hsiang, Lan, Wen How (2016) Output characteristics of a semiconductor laser diode with two circular ring resonators. Japanese Journal of Applied Physics, 55 (4) 4 doi:10.7567/jjap.55.04eh16
Kao, Chyuan Haur, Chen, Hsiang, Huang, Chuan-Yu (2013) Effects of Ti addition and annealing on high-k Gd2O3 sensing membranes on polycrystalline silicon for extended-gate field-effect transistor applications. Applied Surface Science, 286. 328-333 doi:10.1016/j.apsusc.2013.09.080
Hara, Toru, Ishiguro, Takashi, Shinozaki, Kazuo (2011) Ultraviolet-Light-Induced Desorption of Oxygen from SrTiO3Surfaces. Japanese Journal of Applied Physics, 50 (4) 41502 doi:10.7567/jjap.50.041502
Wang, Jer-Chyi, Lu, Tseng-Fu, Shih, Hui-Yu, Yang, Chia-Ming, Lai, Chao-Sung, Kao, Chyuan-Haur, Pan, Tung-Ming (2011) Reference Electrode–Insulator–Nitride–Oxide–Semiconductor Structure with Sm2O3Sensing Membrane for pH-Sensor Application. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04dl09
Yanagida, Masatoshi, Han, Chen, Han, Liyuan (2012) Surface Treatment for Effective Dye Adsorption on Nanocrystalline TiO2. Japanese Journal of Applied Physics, 51 (10) 10 doi:10.7567/jjap.51.10ne16
Fu, Yi, Kao, Chyuan-Haur, Chan, Ya-Ting, Chu, Tzu-Ming, Wang, Jer-Chyi (2019) Multilevel resistive switching behaviors of N2-plasma-treated stacked GdO x /SiN x RRAMs. Japanese Journal of Applied Physics, 58. doi:10.7567/1347-4065/ab03c7
 
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