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Sasaki, Yuki, Kotani, Koji (2012) Postfabrication Independent Inductance and Quality Factor Adjustments of On-Chip Inductors by Above-CMOS Processing for Rapid Prototyping of Radio Frequency System on Chips. Japanese Journal of Applied Physics, 51 (4) 4 doi:10.7567/jjap.51.04de06

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Reference TypeJournal (article/letter/editorial)
TitlePostfabrication Independent Inductance and Quality Factor Adjustments of On-Chip Inductors by Above-CMOS Processing for Rapid Prototyping of Radio Frequency System on Chips
JournalJapanese Journal of Applied Physics
AuthorsSasaki, YukiAuthor
Kotani, KojiAuthor
Year2012 (April 1)Volume51
Issue4
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.51.04de06Search in ResearchGate
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Mindat Ref. ID15042568Long-form Identifiermindat:1:5:15042568:9
GUID0
Full ReferenceSasaki, Yuki, Kotani, Koji (2012) Postfabrication Independent Inductance and Quality Factor Adjustments of On-Chip Inductors by Above-CMOS Processing for Rapid Prototyping of Radio Frequency System on Chips. Japanese Journal of Applied Physics, 51 (4) 4 doi:10.7567/jjap.51.04de06
Plain TextSasaki, Yuki, Kotani, Koji (2012) Postfabrication Independent Inductance and Quality Factor Adjustments of On-Chip Inductors by Above-CMOS Processing for Rapid Prototyping of Radio Frequency System on Chips. Japanese Journal of Applied Physics, 51 (4) 4 doi:10.7567/jjap.51.04de06
In(2012, April) Japanese Journal of Applied Physics Vol. 51 (4) Japan Society of Applied Physics

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Sasaki, Yuki, Kotani, Koji (2012) Postfabrication Independent Inductance and Quality Factor Adjustments of On-Chip Inductors by Above-CMOS Processing for Rapid Prototyping of Radio Frequency System on Chips. Japanese Journal of Applied Physics, 51. 4 doi:10.1143/jjap.51.04de06
Omiya, Yutaka, Kotani, Koji, Ito, Takashi (2010) Above-Complementary Metal–Oxide–Semiconductor Inductor for Rapid Prototyping of Mixed-Signal System on Chips. Japanese Journal of Applied Physics, 49 (4) 4 doi:10.1143/jjap.49.04de13
Kotani, Koji, Sugimoto, Atsuo, Omiya, Yutaka, Ito, Takashi (2011) Above-Complementary Metal–Oxide–Semiconductor Metal Pattern Technique for Postfabrication Tuning of On-Chip Inductor Characteristics. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.7567/jjap.50.04db04
Kotani, Koji, Sugimoto, Atsuo, Omiya, Yutaka, Ito, Takashi (2011) Above-Complementary Metal–Oxide–Semiconductor Metal Pattern Technique for Postfabrication Tuning of On-Chip Inductor Characteristics. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04db04
Kim, Boram, Uno, Shigeyasu, Nakazato, Kazuo (2012) Wireless Charge Based Capacitance Measurement Circuits with On-Chip Spiral Inductor for Radio Frequency Identification Biosensor. Japanese Journal of Applied Physics, 51 (4) 4 doi:10.7567/jjap.51.04de08
Ishikawa, Tomohiro, Lee, Jaesung, Miyake, Ryo (2012) Manipulation of Dispersed Magnetic Beads for On-Chip Immunoassay. Japanese Journal of Applied Physics, 51 (4) 4 doi:10.7567/jjap.51.04de01
Kim, Boram, Uno, Shigeyasu, Nakazato, Kazuo (2012) Wireless Charge Based Capacitance Measurement Circuits with On-Chip Spiral Inductor for Radio Frequency Identification Biosensor. Japanese Journal of Applied Physics, 51. 4 doi:10.1143/jjap.51.04de08
Kimura, Takashi, Kasugai, Hiroki (2012) Properties of Inductively Coupled Radio Frequency CH4/H2Plasmas: Experiments and Global Model. Japanese Journal of Applied Physics, 51 (4) 46202 doi:10.7567/jjap.51.046202
Hasebe, Takayuki, Yamada, Yuki, Tabata, Hitoshi (2012) Analysis of Sharp Dip Structures on Terahertz Transmission Spectra of Metallic Meshes. Japanese Journal of Applied Physics, 51 (4) 4 doi:10.7567/jjap.51.04dl03
Shirane, Atsushi, Ito, Hiroyuki, Ishihara, Noboru, Masu, Kazuya (2012) Planar Solenoidal Inductor in Radio Frequency Micro-Electro-Mechanical Systems Technology for Variable Inductor with Wide Tunable Range and High Quality Factor. Japanese Journal of Applied Physics, 51 (5) 5 doi:10.7567/jjap.51.05ee02
Yasuda, Kenji (2012) On-Chip Cellomics: Constructive Understanding of Multicellular Network Using On-Chip Cellomics Technology. Japanese Journal of Applied Physics, 51 (8) 8 doi:10.7567/jjap.51.08ka03
 
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