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Kimura, Takashi, Yoshida, Ryo, Mishima, Toshihiko, Azuma, Kingo, Nakao, Setsuo (2018) Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges. Japanese Journal of Applied Physics, 57 (6) 6 doi:10.7567/jjap.57.06je02

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Reference TypeJournal (article/letter/editorial)
TitlePreparation of TiN films by reactive high-power pulsed sputtering Penning discharges
JournalJapanese Journal of Applied Physics
AuthorsKimura, TakashiAuthor
Yoshida, RyoAuthor
Mishima, ToshihikoAuthor
Azuma, KingoAuthor
Nakao, SetsuoAuthor
Year2018 (June 1)Volume57
Issue6
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.57.06je02Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15049103Long-form Identifiermindat:1:5:15049103:5
GUID0
Full ReferenceKimura, Takashi, Yoshida, Ryo, Mishima, Toshihiko, Azuma, Kingo, Nakao, Setsuo (2018) Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges. Japanese Journal of Applied Physics, 57 (6) 6 doi:10.7567/jjap.57.06je02
Plain TextKimura, Takashi, Yoshida, Ryo, Mishima, Toshihiko, Azuma, Kingo, Nakao, Setsuo (2018) Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges. Japanese Journal of Applied Physics, 57 (6) 6 doi:10.7567/jjap.57.06je02
In(2018, June) Japanese Journal of Applied Physics Vol. 57 (6) Japan Society of Applied Physics

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Kimura, Takashi, Tanaka, Takahiro (2020) Properties of titanium oxynitride films deposited on glass substrate by reactive high-power pulsed magnetron sputtering. Japanese Journal of Applied Physics, 59. doi:10.7567/1347-4065/ab5e5b
Kimura, Takashi, Nishimura, Ryotaro (2015) Formation of amorphous carbon nitride films by reactive Ar/N2high-power impulse magnetron sputtering. Japanese Journal of Applied Physics, 54 (1) 1 doi:10.7567/jjap.54.01ad06
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