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Sonoda, Tsutomu, Nakao, Setsuo, Ikeyama, Masami (2012) Preparation of MAX-Phase-Containing Ti–Si–C Thin Films by Magnetron Sputtering Using Elemental Targets. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.7567/jjap.51.01ac06

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Reference TypeJournal (article/letter/editorial)
TitlePreparation of MAX-Phase-Containing Ti–Si–C Thin Films by Magnetron Sputtering Using Elemental Targets
JournalJapanese Journal of Applied Physics
AuthorsSonoda, TsutomuAuthor
Nakao, SetsuoAuthor
Ikeyama, MasamiAuthor
Year2012 (January 1)Volume51
Issue1
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.51.01ac06Search in ResearchGate
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Mindat Ref. ID15041608Long-form Identifiermindat:1:5:15041608:3
GUID0
Full ReferenceSonoda, Tsutomu, Nakao, Setsuo, Ikeyama, Masami (2012) Preparation of MAX-Phase-Containing Ti–Si–C Thin Films by Magnetron Sputtering Using Elemental Targets. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.7567/jjap.51.01ac06
Plain TextSonoda, Tsutomu, Nakao, Setsuo, Ikeyama, Masami (2012) Preparation of MAX-Phase-Containing Ti–Si–C Thin Films by Magnetron Sputtering Using Elemental Targets. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.7567/jjap.51.01ac06
In(2012, January) Japanese Journal of Applied Physics Vol. 51 (1) Japan Society of Applied Physics

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Sonoda, Tsutomu, Nakao, Setsuo, Ikeyama, Masami (2012) Preparation of MAX-Phase-Containing Ti–Si–C Thin Films by Magnetron Sputtering Using Elemental Targets. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01ac06
Sonoda, T, Nakao, S, Ikeyama, M (2013) Effects of Substrate Temperature on Ti-Si-C Thin Film Deposited by Sputtering Using Elemental Targets. Journal of Physics: Conference Series, 417. 12063pp. doi:10.1088/1742-6596/417/1/012063
Nakao, Setsuo, Soga, Tetsuo, Sonoda, Tsutomu, Asada, Tokuhiro, Kishi, Naoki (2012) Optical and Electrical Properties of Nitrogen-Doped Diamond-Like Carbon Films Prepared by a Bipolar-Type Plasma-Based Ion Implantation. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.7567/jjap.51.01ac04
Nakao, Setsuo, Soga, Tetsuo, Sonoda, Tsutomu, Asada, Tokuhiro, Kishi, Naoki (2012) Optical and Electrical Properties of Nitrogen-Doped Diamond-Like Carbon Films Prepared by a Bipolar-Type Plasma-Based Ion Implantation. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01ac04
Kuroda, Ken'ichi, Kojima, Kazuyoshi, Tanioku, Masami, Yokoyama, Kazuo, Hamanaka, Koichi (1990) Preparation of Ca-Doped YBaCuO Thin Films Containing 248 Phase by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 29. doi:10.1143/jjap.29.l1439
Masami, Ikeyama, Setsuo, Nakao, Tsutomu, Sonoda, Junho, Choi (2009) Improvement of corrosion protection property of Mg-alloy by DLC and Si–DLC coatings with PBII technique and multi-target DC–RF magnetron sputtering. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 267 (8). 1675-1679 doi:10.1016/j.nimb.2009.01.101
Kaneko, Yasuhisa, Mikoshiba, Nobuo, Yamashita, Tsutomu (1991) Preparation of MgO Thin Films by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 30. 1091-1092 doi:10.1143/jjap.30.1091
Kimura, Takashi, Yoshida, Ryo, Mishima, Toshihiko, Azuma, Kingo, Nakao, Setsuo (2018) Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges. Japanese Journal of Applied Physics, 57 (6) 6 doi:10.7567/jjap.57.06je02
Saitoh, Kazuo, Nakao, Setsuo, Niwa, Hiroaki, Ikeyama, Masami, Miyagawa, Yoshiko, Miyagawa, Soji (1992) Damage Production and Reduction of Single-Crystalline TiN Films by 1.8 MeV Carbon Beam Irradiation. Japanese Journal of Applied Physics, 31. 4020-4024 doi:10.1143/jjap.31.4020
Kuroda, Ken'ichi, Kojima, Kazuyoshi, Tanioku, Masami, Yokoyama, Kazuo, Hamanaka, Koichi (1989) Formation of As-Grown YBaCuO Thin Films by RF Magnetron Sputtering from Three Targets. Japanese Journal of Applied Physics, 28. 1797-1801 doi:10.1143/jjap.28.1797
Mizuno, Masao (2011) Photoluminescence of ZnS–SiO2:Ce Thin Films Deposited by Magnetron Sputtering. Japanese Journal of Applied Physics, 50 (12) 128002 doi:10.7567/jjap.50.128002
 
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