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Yoshimura, Satoru, Kuppan, Munusamy (2018) Fabrication of high-qualified (Bi1βˆ’ x Ba x )FeO3 multiferroic thin films by using a pulsed DC reactive sputtering method and demonstration of magnetization reversal by electric field. Japanese Journal of Applied Physics, 57 (9) 902 doi:10.7567/jjap.57.0902b7

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Reference TypeJournal (article/letter/editorial)
TitleFabrication of high-qualified (Bi1βˆ’ x Ba x )FeO3 multiferroic thin films by using a pulsed DC reactive sputtering method and demonstration of magnetization reversal by electric field
JournalJapanese Journal of Applied Physics
AuthorsYoshimura, SatoruAuthor
Kuppan, MunusamyAuthor
Year2018 (September 1)Volume57
Issue9
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.57.0902b7Search in ResearchGate
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Mindat Ref. ID15049504Long-form Identifiermindat:1:5:15049504:0
GUID0
Full ReferenceYoshimura, Satoru, Kuppan, Munusamy (2018) Fabrication of high-qualified (Bi1βˆ’ x Ba x )FeO3 multiferroic thin films by using a pulsed DC reactive sputtering method and demonstration of magnetization reversal by electric field. Japanese Journal of Applied Physics, 57 (9) 902 doi:10.7567/jjap.57.0902b7
Plain TextYoshimura, Satoru, Kuppan, Munusamy (2018) Fabrication of high-qualified (Bi1βˆ’ x Ba x )FeO3 multiferroic thin films by using a pulsed DC reactive sputtering method and demonstration of magnetization reversal by electric field. Japanese Journal of Applied Physics, 57 (9) 902 doi:10.7567/jjap.57.0902b7
In(2018, September) Japanese Journal of Applied Physics Vol. 57 (9) Japan Society of Applied Physics

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Kimura, Takashi, Yoshida, Ryo, Mishima, Toshihiko, Azuma, Kingo, Nakao, Setsuo (2018) Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges. Japanese Journal of Applied Physics, 57 (6) 6 doi:10.7567/jjap.57.06je02
Yoshimura, Kazuki, Miki, Takeshi, Tanemura, Sakae (1995) Nickel Oxide Electrochromic Thin Films Prepared by Reactive DC Magnetron Sputtering. Japanese Journal of Applied Physics, 34. 2440-2446 doi:10.1143/jjap.34.2440
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Ohtsuka, Makoto, Takeuchi, Hiroto, Fukuyama, Hiroyuki (2016) Effect of sputtering pressure on crystalline quality and residual stress of AlN films deposited at 823 K on nitrided sapphire substrates by pulsed DC reactive sputtering. Japanese Journal of Applied Physics, 55 (5) 5 doi:10.7567/jjap.55.05fd08
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