Reference Type | Journal (article/letter/editorial) |
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Title | Silicon heteroepitaxy: interface structure and physical properties |
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Journal | Journal of Crystal Growth |
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Authors | von Känel, H. | Author |
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Müller, E. | Author |
Nissen, H.-U. | Author |
Bacsa, W. | Author |
Ospelt, M. | Author |
Mäder, K.A. | Author |
Stalder, R. | Author |
Baldereschi, A. | Author |
Year | 1991 (May) | Volume | 111 |
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Issue | 1 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/0022-0248(91)91102-gSearch in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 2801562 | Long-form Identifier | mindat:1:5:2801562:0 |
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GUID | 0 |
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Full Reference | von Känel, H., Müller, E., Nissen, H.-U., Bacsa, W., Ospelt, M., Mäder, K.A., Stalder, R., Baldereschi, A. (1991) Silicon heteroepitaxy: interface structure and physical properties. Journal of Crystal Growth, 111 (1). 889-896 doi:10.1016/0022-0248(91)91102-g |
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Plain Text | von Känel, H., Müller, E., Nissen, H.-U., Bacsa, W., Ospelt, M., Mäder, K.A., Stalder, R., Baldereschi, A. (1991) Silicon heteroepitaxy: interface structure and physical properties. Journal of Crystal Growth, 111 (1). 889-896 doi:10.1016/0022-0248(91)91102-g |
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In | (1991, May) Journal of Crystal Growth Vol. 111 (1) Elsevier BV |
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