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von Känel, H., Müller, E., Nissen, H.-U., Bacsa, W., Ospelt, M., Mäder, K.A., Stalder, R., Baldereschi, A. (1991) Silicon heteroepitaxy: interface structure and physical properties. Journal of Crystal Growth, 111 (1). 889-896 doi:10.1016/0022-0248(91)91102-g

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Reference TypeJournal (article/letter/editorial)
TitleSilicon heteroepitaxy: interface structure and physical properties
JournalJournal of Crystal Growth
Authorsvon Känel, H.Author
Müller, E.Author
Nissen, H.-U.Author
Bacsa, W.Author
Ospelt, M.Author
Mäder, K.A.Author
Stalder, R.Author
Baldereschi, A.Author
Year1991 (May)Volume111
Issue1
PublisherElsevier BV
DOIdoi:10.1016/0022-0248(91)91102-gSearch in ResearchGate
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Mindat Ref. ID2801562Long-form Identifiermindat:1:5:2801562:0
GUID0
Full Referencevon Känel, H., Müller, E., Nissen, H.-U., Bacsa, W., Ospelt, M., Mäder, K.A., Stalder, R., Baldereschi, A. (1991) Silicon heteroepitaxy: interface structure and physical properties. Journal of Crystal Growth, 111 (1). 889-896 doi:10.1016/0022-0248(91)91102-g
Plain Textvon Känel, H., Müller, E., Nissen, H.-U., Bacsa, W., Ospelt, M., Mäder, K.A., Stalder, R., Baldereschi, A. (1991) Silicon heteroepitaxy: interface structure and physical properties. Journal of Crystal Growth, 111 (1). 889-896 doi:10.1016/0022-0248(91)91102-g
In(1991, May) Journal of Crystal Growth Vol. 111 (1) Elsevier BV


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