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Kaltofen, R., Weise, G. (1993) Influence of low-energy bombardment of an RF magnetron sputtering discharge on texture formation and stress in ZnO films. Journal of Nuclear Materials, 200 (3). 375-379 doi:10.1016/0022-3115(93)90312-m

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of low-energy bombardment of an RF magnetron sputtering discharge on texture formation and stress in ZnO films
JournalJournal of Nuclear Materials
AuthorsKaltofen, R.Author
Weise, G.Author
Year1993 (May)Volume200
Issue3
PublisherElsevier BV
DOIdoi:10.1016/0022-3115(93)90312-mSearch in ResearchGate
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Mindat Ref. ID4150499Long-form Identifiermindat:1:5:4150499:2
GUID0
Full ReferenceKaltofen, R., Weise, G. (1993) Influence of low-energy bombardment of an RF magnetron sputtering discharge on texture formation and stress in ZnO films. Journal of Nuclear Materials, 200 (3). 375-379 doi:10.1016/0022-3115(93)90312-m
Plain TextKaltofen, R., Weise, G. (1993) Influence of low-energy bombardment of an RF magnetron sputtering discharge on texture formation and stress in ZnO films. Journal of Nuclear Materials, 200 (3). 375-379 doi:10.1016/0022-3115(93)90312-m
In(1993, May) Journal of Nuclear Materials Vol. 200 (3) Elsevier BV

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Kaltofen, R., Weise, G., Marschner, J. (1991) Preparation of Piezoelectric ZnO Films by DC and RF Magnetron Sputtering. Materials Science Forum, 62. 329-330 doi:10.4028/www.scientific.net/msf.62-64.329
Escrivão, M.L., Moutinho, A.M.C., Maneira, M.J.P. (1993) Planar magnetron glow discharge on copper — The Thornton relation revisited. Journal of Nuclear Materials, 200 (3). 300-304 doi:10.1016/0022-3115(93)90299-e
(1993) Subject index. Journal of Nuclear Materials, 206 (2). 375-379 doi:10.1016/0022-3115(93)90139-p
Feoktistov, V.A., Lopaev, D.V., Klopovsky, K.S., Popov, A.M., Popovicheva, O.B., Rakhimov, A.T., Rakhimova, T.V. (1993) Low pressure RF discharge in electronegative gases for plasma processing. Journal of Nuclear Materials, 200 (3). 309-314 doi:10.1016/0022-3115(93)90301-e
(1993) Subject index. Journal of Nuclear Materials, 200 (3). 439-447 doi:10.1016/0022-3115(93)90324-r
Peter, S., Pintaske, R., Hecht, G., Richter, F. (1993) Ion energy distribution measurements in glow discharges. Journal of Nuclear Materials, 200 (3). 412-416 doi:10.1016/0022-3115(93)90318-s
Goedheer, W.J., Meijer, P.M. (1993) Numerical simulation of RF discharges for plasma processing. Journal of Nuclear Materials, 200 (3). 282-290 doi:10.1016/0022-3115(93)90296-b
Mansur, L.K. (1993) The science and engineering of nuclear materials. Journal of Nuclear Materials, 200 (1). doi:10.1016/0022-3115(93)90002-g
Kleyn, Aart W. (1993) Preface. Journal of Nuclear Materials, 200 (3). doi:10.1016/0022-3115(93)90294-9
(1993) Author index. Journal of Nuclear Materials, 200 (3). 435-438 doi:10.1016/0022-3115(93)90323-q
Tsuzuki, K., Banno, T., Kinbara, A., Nakagawa, Y., Tsukada, T. (1993) Measurements of distribution of self-bias potential on an RF-plane electrode in plasma etching devices. Journal of Nuclear Materials, 200 (3). 291-295 doi:10.1016/0022-3115(93)90297-c
 
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