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Ikeda, Kazuya, Isobe, Yasuhiro, Ikki, Hiromichi, Sakakibara, Tatsuyuki, Iwaya, Motoaki, Takeuchi, Tetsuya, Kamiyama, Satoshi, Akasaki, Isamu, Amano, Hiroshi (2012) Fabrication of AlInN/AlN/GaInN/GaN heterostructure field-effect transistors. physica status solidi (c), 9 (3). 942-944 doi:10.1002/pssc.201100492

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Reference TypeJournal (article/letter/editorial)
TitleFabrication of AlInN/AlN/GaInN/GaN heterostructure field-effect transistors
Journalphysica status solidi (c)
AuthorsIkeda, KazuyaAuthor
Isobe, YasuhiroAuthor
Ikki, HiromichiAuthor
Sakakibara, TatsuyukiAuthor
Iwaya, MotoakiAuthor
Takeuchi, TetsuyaAuthor
Kamiyama, SatoshiAuthor
Akasaki, IsamuAuthor
Amano, HiroshiAuthor
Year2012 (March)Volume9
Issue3
PublisherWiley
DOIdoi:10.1002/pssc.201100492Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5122826Long-form Identifiermindat:1:5:5122826:8
GUID0
Full ReferenceIkeda, Kazuya, Isobe, Yasuhiro, Ikki, Hiromichi, Sakakibara, Tatsuyuki, Iwaya, Motoaki, Takeuchi, Tetsuya, Kamiyama, Satoshi, Akasaki, Isamu, Amano, Hiroshi (2012) Fabrication of AlInN/AlN/GaInN/GaN heterostructure field-effect transistors. physica status solidi (c), 9 (3). 942-944 doi:10.1002/pssc.201100492
Plain TextIkeda, Kazuya, Isobe, Yasuhiro, Ikki, Hiromichi, Sakakibara, Tatsuyuki, Iwaya, Motoaki, Takeuchi, Tetsuya, Kamiyama, Satoshi, Akasaki, Isamu, Amano, Hiroshi (2012) Fabrication of AlInN/AlN/GaInN/GaN heterostructure field-effect transistors. physica status solidi (c), 9 (3). 942-944 doi:10.1002/pssc.201100492
In(2012, March) physica status solidi (c) Vol. 9 (3) Wiley


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