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Cheng, Y. H., Kupfer, H., Richter, F. (2003) Influence of duty cycle on the structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering. Journal of Applied Physics, 94 (5). 3624-3628 doi:10.1063/1.1599628

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of duty cycle on the structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering
JournalJournal of Applied Physics
AuthorsCheng, Y. H.Author
Kupfer, H.Author
Richter, F.Author
Year2003 (September)Volume94
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.1599628Search in ResearchGate
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Mindat Ref. ID5123044Long-form Identifiermindat:1:5:5123044:9
GUID0
Full ReferenceCheng, Y. H., Kupfer, H., Richter, F. (2003) Influence of duty cycle on the structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering. Journal of Applied Physics, 94 (5). 3624-3628 doi:10.1063/1.1599628
Plain TextCheng, Y. H., Kupfer, H., Richter, F. (2003) Influence of duty cycle on the structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering. Journal of Applied Physics, 94 (5). 3624-3628 doi:10.1063/1.1599628
In(2003, September) Journal of Applied Physics Vol. 94 (5) AIP Publishing

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Cheng, Y.H, Kupfer, H, Richter, F, Paraian, Andreea Maria (2002) Deposition of MgO films by pulsed mid-frequency magnetron sputtering. Applied Surface Science, 200. 117-124 doi:10.1016/s0169-4332(02)00618-9
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