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Pfeifer, Th., Richter, F., Welzel, Th., Kupfer, H., Willich, P. (2003) Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering. Journal of Applied Physics, 93 (4). 2009-2014 doi:10.1063/1.1538322

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering
JournalJournal of Applied Physics
AuthorsPfeifer, Th.Author
Richter, F.Author
Welzel, Th.Author
Kupfer, H.Author
Willich, P.Author
Year2003 (February 15)Volume93
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.1538322Search in ResearchGate
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Mindat Ref. ID5120265Long-form Identifiermindat:1:5:5120265:9
GUID0
Full ReferencePfeifer, Th., Richter, F., Welzel, Th., Kupfer, H., Willich, P. (2003) Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering. Journal of Applied Physics, 93 (4). 2009-2014 doi:10.1063/1.1538322
Plain TextPfeifer, Th., Richter, F., Welzel, Th., Kupfer, H., Willich, P. (2003) Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering. Journal of Applied Physics, 93 (4). 2009-2014 doi:10.1063/1.1538322
In(2003, February) Journal of Applied Physics Vol. 93 (4) AIP Publishing

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Welzel, Th., Dunger, Th., Kupfer, H., Richter, F. (2004) A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges. Journal of Applied Physics, 96 (12). 6994-7001 doi:10.1063/1.1808481
Cheng, Y. H., Kupfer, H., Richter, F. (2003) Influence of duty cycle on the structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering. Journal of Applied Physics, 94 (5). 3624-3628 doi:10.1063/1.1599628
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Welzel, Th, Dunger, Th, Liebig, B, Richter, F (2008) Spatial and temporal development of the plasma potential in differently configured pulsed magnetron discharges. New Journal of Physics, 10. 123008pp. doi:10.1088/1367-2630/10/12/123008
Kistenmacher, Thomas J., Bryden, Wayne A. (1991) Overgrowth of indium nitride thin films on aluminum nitride nucleated (00.1) sapphire by reactive magnetron sputtering. Applied Physics Letters, 59 (15). 1844-1846 doi:10.1063/1.106190
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