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Deniz, D., Harper, J. M. E. (2008) Fiber textures of titanium nitride and hafnium nitride thin films deposited by off-normal incidence magnetron sputtering. Journal of Applied Physics, 104 (6). 63519pp. doi:10.1063/1.2980325

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Reference TypeJournal (article/letter/editorial)
TitleFiber textures of titanium nitride and hafnium nitride thin films deposited by off-normal incidence magnetron sputtering
JournalJournal of Applied Physics
AuthorsDeniz, D.Author
Harper, J. M. E.Author
Year2008 (September 15)Volume104
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.2980325Search in ResearchGate
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Mindat Ref. ID5159911Long-form Identifiermindat:1:5:5159911:1
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Full ReferenceDeniz, D., Harper, J. M. E. (2008) Fiber textures of titanium nitride and hafnium nitride thin films deposited by off-normal incidence magnetron sputtering. Journal of Applied Physics, 104 (6). 63519pp. doi:10.1063/1.2980325
Plain TextDeniz, D., Harper, J. M. E. (2008) Fiber textures of titanium nitride and hafnium nitride thin films deposited by off-normal incidence magnetron sputtering. Journal of Applied Physics, 104 (6). 63519pp. doi:10.1063/1.2980325
In(2008, September) Journal of Applied Physics Vol. 104 (6) AIP Publishing

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Deniz, D., Karabacak, T., Harper, J. M. E. (2008) Competitive growth mechanisms of aluminum nitride thin films deposited by off-normal reactive magnetron sputtering. Journal of Applied Physics, 103 (8). 83553pp. doi:10.1063/1.2917063
Saha, Bivas, Naik, Gururaj, Drachev, Vladimir P., Boltasseva, Alexandra, Marinero, Ernesto E., Sands, Timothy D. (2013) Electronic and optical properties of ScN and (Sc,Mn)N thin films deposited by reactive DC-magnetron sputtering. Journal of Applied Physics, 114 (6). 63519pp. doi:10.1063/1.4817715
Kim, Joo Han, Chung, Ki Woong (1998) Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering. Journal of Applied Physics, 83 (11). 5831-5839 doi:10.1063/1.367440
Kistenmacher, Thomas J., Bryden, Wayne A. (1991) Overgrowth of indium nitride thin films on aluminum nitride nucleated (00.1) sapphire by reactive magnetron sputtering. Applied Physics Letters, 59 (15). 1844-1846 doi:10.1063/1.106190
Shen, Y. G., Mai, Y. W., McKenzie, D. R., Zhang, Q. C., McFall, W. D., McBride, W. E. (2000) Composition, residual stress, and structural properties of thin tungsten nitride films deposited by reactive magnetron sputtering. Journal of Applied Physics, 88 (3). 1380-1388 doi:10.1063/1.373827
Merie, Violeta, Pustan, Marius, Negrea, Gavril, Bîrleanu, Corina (2015) Research on titanium nitride thin films deposited by reactive magnetron sputtering for MEMS applications. Applied Surface Science, 358. 525-532 doi:10.1016/j.apsusc.2015.07.063
Gotoh, Yasuhito, Liao, Mei Yong, Tsuji, Hiroshi, Ishikawa, Junzo (2003) Formation and Control of Stoichiometric Hafnium Nitride Thin Films by Direct Sputtering of Hafnium Nitride Target. Japanese Journal of Applied Physics, 42. doi:10.1143/jjap.42.l778
Abadias, G., Guerin, Ph. (2008) In situ stress evolution during magnetron sputtering of transition metal nitride thin films. Applied Physics Letters, 93 (11). 111908pp. doi:10.1063/1.2985814
Dogheche, E., Rémiens, D., Boudrioua, A., Loulergue, J. C. (1999) Growth and optical characterization of aluminum nitride thin films deposited on silicon by radio-frequency sputtering. Applied Physics Letters, 74 (9). 1209-1211 doi:10.1063/1.123501
Hajihoseini, H, Gudmundsson, J T (2017) Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering. Journal of Physics D: Applied Physics, 50. 505302pp. doi:10.1088/1361-6463/aa96f2
Buranawong, Adisorn, Chaiyakhun, Surasing, Limsuwan, Pichet (2010) Characterization of Aluminium Titanium Nitride Thin Films Deposited by Reactive Magnetron Co-Sputtering. Advanced Materials Research, 93. 340-343 doi:10.4028/www.scientific.net/amr.93-94.340
 
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