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Welzel, Th., Dunger, Th., Kupfer, H., Richter, F. (2004) A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges. Journal of Applied Physics, 96 (12). 6994-7001 doi:10.1063/1.1808481

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Reference TypeJournal (article/letter/editorial)
TitleA time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges
JournalJournal of Applied Physics
AuthorsWelzel, Th.Author
Dunger, Th.Author
Kupfer, H.Author
Richter, F.Author
Year2004 (December 15)Volume96
Issue12
PublisherAIP Publishing
DOIdoi:10.1063/1.1808481Search in ResearchGate
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Mindat Ref. ID5128102Long-form Identifiermindat:1:5:5128102:7
GUID0
Full ReferenceWelzel, Th., Dunger, Th., Kupfer, H., Richter, F. (2004) A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges. Journal of Applied Physics, 96 (12). 6994-7001 doi:10.1063/1.1808481
Plain TextWelzel, Th., Dunger, Th., Kupfer, H., Richter, F. (2004) A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges. Journal of Applied Physics, 96 (12). 6994-7001 doi:10.1063/1.1808481
In(2004, December) Journal of Applied Physics Vol. 96 (12) AIP Publishing

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Welzel, Th, Dunger, Th, Liebig, B, Richter, F (2008) Spatial and temporal development of the plasma potential in differently configured pulsed magnetron discharges. New Journal of Physics, 10. 123008pp. doi:10.1088/1367-2630/10/12/123008
Pfeifer, Th., Richter, F., Welzel, Th., Kupfer, H., Willich, P. (2003) Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering. Journal of Applied Physics, 93 (4). 2009-2014 doi:10.1063/1.1538322
Welzel, Th., Naumov, S., Ellmer, K. (2011) Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions. Journal of Applied Physics, 109 (7). 73302pp. doi:10.1063/1.3553846
Welzel, Th., Naumov, S., Ellmer, K. (2011) Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions. Journal of Applied Physics, 109 (7). 73303pp. doi:10.1063/1.3553847
Bárdoš, L., Baránková, H., Welzel, Th., Dani, I., Peter, S., Richter, F. (2001) Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing. Journal of Applied Physics, 90 (4). 1703-1709 doi:10.1063/1.1385355
Qin, Shu, McTeer, Allen (2005) Time-delayed, time-resolved Langmuir probe diagnostics of pulsed plasmas. Applied Physics Letters, 87 (24). 241506pp. doi:10.1063/1.2146209
Daube, Th., Meyer, P., Riemann, K.-U., Schmitz, H. (2002) Relaxation phenomena in pulsed discharges. Journal of Applied Physics, 91 (4). 1787-1796 doi:10.1063/1.1430895
Bryant, P. M., Voronin, S. A., Bradley, J. W., Vetushka, A. (2007) Time-resolved triple probe investigations of a pulsed magnetron discharge. Journal of Applied Physics, 102 (4). 43302pp. doi:10.1063/1.2769805
Cheng, Y. H., Kupfer, H., Richter, F., Giegengack, H., Hoyer, W. (2003) Structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering. Journal of Applied Physics, 93 (3). 1422-1427 doi:10.1063/1.1534375
Cheng, Y. H., Kupfer, H., Richter, F. (2003) Influence of duty cycle on the structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering. Journal of Applied Physics, 94 (5). 3624-3628 doi:10.1063/1.1599628
Bertuccelli, G., Di Rocco, H. O., Ranea‐Sandoval, H. F., Sherar, A. (1991) Ionic assignment in Xe pulsed discharges by time‐resolved spectral analysis. Journal of Applied Physics, 69 (11). 7500-7502 doi:10.1063/1.347566
 
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