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Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Jordan-Sweet, J. L., Lavoie, C. (2007) Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements. Journal of Applied Physics, 101 (4). 44508pp. doi:10.1063/1.2433133

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Reference TypeJournal (article/letter/editorial)
TitleFormation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements
JournalJournal of Applied Physics
AuthorsDeduytsche, D.Author
Detavernier, C.Author
Van Meirhaeghe, R. L.Author
Jordan-Sweet, J. L.Author
Lavoie, C.Author
Year2007 (February 15)Volume101
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.2433133Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5147007Long-form Identifiermindat:1:5:5147007:4
GUID0
Full ReferenceDeduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Jordan-Sweet, J. L., Lavoie, C. (2007) Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements. Journal of Applied Physics, 101 (4). 44508pp. doi:10.1063/1.2433133
Plain TextDeduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Jordan-Sweet, J. L., Lavoie, C. (2007) Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements. Journal of Applied Physics, 101 (4). 44508pp. doi:10.1063/1.2433133
In(2007, February) Journal of Applied Physics Vol. 101 (4) AIP Publishing

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Van Bockstael, C., De Keyser, K., Deduytsche, D., Van Meirhaeghe, R. L., Detavernier, C., Jordan-Sweet, J. L., Lavoie, C. (2008) Effect of Pt addition on growth stress and thermal stress of NiSi films. Journal of Applied Physics, 104 (5). 53510pp. doi:10.1063/1.2973679
Van Bockstael, C., De Keyser, K., Van Meirhaeghe, R. L., Detavernier, C., Jordan-Sweet, J. L., Lavoie, C. (2009) Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films. Applied Physics Letters, 94 (3). 33504pp. doi:10.1063/1.3073750
Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Lavoie, C. (2005) High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation. Journal of Applied Physics, 98 (3). 33526pp. doi:10.1063/1.2005380
Van Bockstael, C., Detavernier, C., Van Meirhaeghe, R. L., Jordan-Sweet, J. L., Lavoie, C. (2009) In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers. Journal of Applied Physics, 106 (6). 64515pp. doi:10.1063/1.3194318
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Opsomer, K., Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Lauwers, A., Maex, K., Lavoie, C. (2007) Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions. Applied Physics Letters, 90 (3). 31906pp. doi:10.1063/1.2431781
Knaepen, W., Gaudet, S., Detavernier, C., Van Meirhaeghe, R. L., Sweet, J. Jordan, Lavoie, C. (2009) In situ x-ray diffraction study of metal induced crystallization of amorphous germanium. Journal of Applied Physics, 105 (8). 83532pp. doi:10.1063/1.3110722
Leroy, W. P., Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Poelman, D., Lavoie, C. (2006) In-situX-ray diffraction measurements for monitoring carbide and silicide phase formation. Acta Crystallographica Section A Foundations of Crystallography, 62. doi:10.1107/s0108767306097716
Detavernier, C., Lavoie, C., d’Heurle, F. M., Bender, H., Van Meirhaeghe, R. L. (2004) Low-temperature formation of CoSi2 in the presence of Au. Journal of Applied Physics, 95 (10). 5340-5346 doi:10.1063/1.1691180
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