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De Keyser, K., Van Bockstael, C., Van Meirhaeghe, R. L., Detavernier, C., Verleysen, E., Bender, H., Vandervorst, W., Jordan-Sweet, J., Lavoie, C. (2010) Phase formation and thermal stability of ultrathin nickel-silicides on Si(100). Applied Physics Letters, 96 (17). 173503pp. doi:10.1063/1.3384997

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Reference TypeJournal (article/letter/editorial)
TitlePhase formation and thermal stability of ultrathin nickel-silicides on Si(100)
JournalApplied Physics Letters
AuthorsDe Keyser, K.Author
Van Bockstael, C.Author
Van Meirhaeghe, R. L.Author
Detavernier, C.Author
Verleysen, E.Author
Bender, H.Author
Vandervorst, W.Author
Jordan-Sweet, J.Author
Lavoie, C.Author
Year2010 (April 26)Volume96
Issue17
PublisherAIP Publishing
DOIdoi:10.1063/1.3384997Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8583054Long-form Identifiermindat:1:5:8583054:5
GUID0
Full ReferenceDe Keyser, K., Van Bockstael, C., Van Meirhaeghe, R. L., Detavernier, C., Verleysen, E., Bender, H., Vandervorst, W., Jordan-Sweet, J., Lavoie, C. (2010) Phase formation and thermal stability of ultrathin nickel-silicides on Si(100). Applied Physics Letters, 96 (17). 173503pp. doi:10.1063/1.3384997
Plain TextDe Keyser, K., Van Bockstael, C., Van Meirhaeghe, R. L., Detavernier, C., Verleysen, E., Bender, H., Vandervorst, W., Jordan-Sweet, J., Lavoie, C. (2010) Phase formation and thermal stability of ultrathin nickel-silicides on Si(100). Applied Physics Letters, 96 (17). 173503pp. doi:10.1063/1.3384997
In(2010, April) Applied Physics Letters Vol. 96 (17) AIP Publishing

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Van Bockstael, C., De Keyser, K., Van Meirhaeghe, R. L., Detavernier, C., Jordan-Sweet, J. L., Lavoie, C. (2009) Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films. Applied Physics Letters, 94 (3). 33504pp. doi:10.1063/1.3073750
Van Bockstael, C., De Keyser, K., Deduytsche, D., Van Meirhaeghe, R. L., Detavernier, C., Jordan-Sweet, J. L., Lavoie, C. (2008) Effect of Pt addition on growth stress and thermal stress of NiSi films. Journal of Applied Physics, 104 (5). 53510pp. doi:10.1063/1.2973679
Van Bockstael, C., Detavernier, C., Van Meirhaeghe, R. L., Jordan-Sweet, J. L., Lavoie, C. (2009) In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers. Journal of Applied Physics, 106 (6). 64515pp. doi:10.1063/1.3194318
De Keyser, K., Van Meirhaeghe, R. L., Detavernier, C., Jordan-Sweet, J., Lavoie, C. (2010) Texture of Cobalt Germanides on Ge(100) and Ge(111) and Its Influence on the Formation Temperature. Journal of the Electrochemical Society, 157. doi:10.1149/1.3294702
Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Jordan-Sweet, J. L., Lavoie, C. (2007) Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements. Journal of Applied Physics, 101 (4). 44508pp. doi:10.1063/1.2433133
Geenen, F. A., van Stiphout, K., Nanakoudis, A., Bals, S., Vantomme, A., Jordan-Sweet, J., Lavoie, C., Detavernier, C. (2018) Controlling the formation and stability of ultra-thin nickel silicides - An alloying strategy for preventing agglomeration. Journal of Applied Physics, 123 (7). 75303pp. doi:10.1063/1.5009641
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Detavernier, C., Van Meirhaeghe, R. L., Cardon, F., Maex, K., Vandervorst, W., Brijs, B. (2000) Influence of Ti on CoSi2 nucleation. Applied Physics Letters, 77 (20). 3170-3172 doi:10.1063/1.1325401
Detavernier, C., Van Meirhaeghe, R. L., Cardon, F., Maex, K., Bender, H., Brijs, B., Vandervorst, W. (2001) Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer. Journal of Applied Physics, 89 (4). 2146-2150 doi:10.1063/1.1340598
 
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