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Pan, Tung-Ming, Hou, Sung-Ju, Wang, Chih-Hwa (2008) Effects of nitrogen content on the structure and electrical properties of high-k NdOxNy gate dielectrics. Journal of Applied Physics, 103 (12). 124105pp. doi:10.1063/1.2942405

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Reference TypeJournal (article/letter/editorial)
TitleEffects of nitrogen content on the structure and electrical properties of high-k NdOxNy gate dielectrics
JournalJournal of Applied Physics
AuthorsPan, Tung-MingAuthor
Hou, Sung-JuAuthor
Wang, Chih-HwaAuthor
Year2008 (June 15)Volume103
Issue12
PublisherAIP Publishing
DOIdoi:10.1063/1.2942405Search in ResearchGate
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Mindat Ref. ID5153531Long-form Identifiermindat:1:5:5153531:7
GUID0
Full ReferencePan, Tung-Ming, Hou, Sung-Ju, Wang, Chih-Hwa (2008) Effects of nitrogen content on the structure and electrical properties of high-k NdOxNy gate dielectrics. Journal of Applied Physics, 103 (12). 124105pp. doi:10.1063/1.2942405
Plain TextPan, Tung-Ming, Hou, Sung-Ju, Wang, Chih-Hwa (2008) Effects of nitrogen content on the structure and electrical properties of high-k NdOxNy gate dielectrics. Journal of Applied Physics, 103 (12). 124105pp. doi:10.1063/1.2942405
In(2008, June) Journal of Applied Physics Vol. 103 (12) AIP Publishing

See Also

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Pan, Tung-Ming, Hou, Sung-Ju (2008) Effect of postdeposition annealing on the interfacial and electrical properties of high-k NdOxNy gate dielectrics. Applied Physics Letters, 92 (7). 72907pp. doi:10.1063/1.2884333
Pan, Tung-Ming, Chen, Chun-Lin, Yeh, Wen Wei, Hou, Sung-Ju (2006) Structural and electrical characteristics of thin erbium oxide gate dielectrics. Applied Physics Letters, 89 (22). 222912pp. doi:10.1063/1.2399938
Pan, Tung-Ming, Shu, Wei-Hao (2008) Influence of Neodymium Content on Structural Properties and Electrical Characteristics of High-k NdTiO[sub 3] Gate Dielectrics. Journal of the Electrochemical Society, 155. doi:10.1149/1.2835213
Pan, Tung-Ming, Huang, Chun-Chin (2010) Effects of oxygen content and postdeposition annealing on the physical and electrical properties of thin Sm2O3 gate dielectrics. Applied Surface Science, 256. 7186-7193 doi:10.1016/j.apsusc.2010.05.048
Pan, Tung-Ming, Lee, Jian-Der, Shu, Wei-Hao, Chen, Tsung-Te (2006) Structural and electrical properties of neodymium oxide high-k gate dielectrics. Applied Physics Letters, 89 (23). 232908pp. doi:10.1063/1.2402237
Pan, Tung-Ming, Lee, Jian-Der, Yeh, Wen-Wei (2007) Influence of oxygen content on the structural and electrical characteristics of thin neodymium oxide gate dielectrics. Journal of Applied Physics, 101 (2). 24110pp. doi:10.1063/1.2426937
Pan, Tung-Ming, Huang, Wei-Shiang (2009) Effects of Oxygen Content on the Structural and Electrical Properties of Thin Yb[sub 2]O[sub 3] Gate Dielectrics. Journal of the Electrochemical Society, 156. doi:10.1149/1.3005993
Pan, Tung-Ming, Yen, Li-Chen (2010) Structural properties and electrical characteristics of high-k Tm2Ti2O7 gate dielectrics. Applied Surface Science, 256. 1845-1848 doi:10.1016/j.apsusc.2009.10.017
Pan, Tung-Ming, Shu, Wei-Hao (2008) Influence of Titanium Content on the Structural and Electrical Properties of Er[sub 1βˆ’x]Ti[sub x]O[sub y] Gate Dielectrics. Journal of the Electrochemical Society, 155. doi:10.1149/1.2839556
Pan, Tung-Ming, Chang, Wei-Tsung, Chiu, Fu-Chien (2011) Structural properties and electrical characteristics of high-k Dy2O3 gate dielectrics. Applied Surface Science, 257. 3964-3968 doi:10.1016/j.apsusc.2010.11.144
Pan, Tung-Ming, Yen, Li-Chen, Su, Sheng-Han (2009) Effect of post-deposition annealing on structural and electrical properties of high-k HoTiO3 gate dielectrics. Applied Surface Science, 256. 1534-1537 doi:10.1016/j.apsusc.2009.09.017
 
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