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Biju, Kuyyadi P., Liu, Xinjun, Siddik, Manzar, Kim, Seonghyun, Shin, Jungho, Kim, Insung, Ignatiev, Alex, Hwang, Hyunsang (2011) Resistive switching characteristics and mechanism of thermally grown WOx thin films. Journal of Applied Physics, 110 (6). 64505pp. doi:10.1063/1.3633227

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Reference TypeJournal (article/letter/editorial)
TitleResistive switching characteristics and mechanism of thermally grown WOx thin films
JournalJournal of Applied Physics
AuthorsBiju, Kuyyadi P.Author
Liu, XinjunAuthor
Siddik, ManzarAuthor
Kim, SeonghyunAuthor
Shin, JunghoAuthor
Kim, InsungAuthor
Ignatiev, AlexAuthor
Hwang, HyunsangAuthor
Year2011 (September 15)Volume110
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.3633227Search in ResearchGate
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Mindat Ref. ID5186005Long-form Identifiermindat:1:5:5186005:5
GUID0
Full ReferenceBiju, Kuyyadi P., Liu, Xinjun, Siddik, Manzar, Kim, Seonghyun, Shin, Jungho, Kim, Insung, Ignatiev, Alex, Hwang, Hyunsang (2011) Resistive switching characteristics and mechanism of thermally grown WOx thin films. Journal of Applied Physics, 110 (6). 64505pp. doi:10.1063/1.3633227
Plain TextBiju, Kuyyadi P., Liu, Xinjun, Siddik, Manzar, Kim, Seonghyun, Shin, Jungho, Kim, Insung, Ignatiev, Alex, Hwang, Hyunsang (2011) Resistive switching characteristics and mechanism of thermally grown WOx thin films. Journal of Applied Physics, 110 (6). 64505pp. doi:10.1063/1.3633227
In(2011, September) Journal of Applied Physics Vol. 110 (6) AIP Publishing

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