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Bommali, R. K., Ghosh, S., Vijaya Prakash, G., Gao, K., Zhou, S., Khan, S. A., Srivastava, P. (2014) Hydrogen plasma induced modification of photoluminescence from a-SiNx:H thin films. Journal of Applied Physics, 115 (5). 53525pp. doi:10.1063/1.4864255

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Reference TypeJournal (article/letter/editorial)
TitleHydrogen plasma induced modification of photoluminescence from a-SiNx:H thin films
JournalJournal of Applied Physics
AuthorsBommali, R. K.Author
Ghosh, S.Author
Vijaya Prakash, G.Author
Gao, K.Author
Zhou, S.Author
Khan, S. A.Author
Srivastava, P.Author
Year2014 (February 7)Volume115
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.4864255Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5198321Long-form Identifiermindat:1:5:5198321:3
GUID0
Full ReferenceBommali, R. K., Ghosh, S., Vijaya Prakash, G., Gao, K., Zhou, S., Khan, S. A., Srivastava, P. (2014) Hydrogen plasma induced modification of photoluminescence from a-SiNx:H thin films. Journal of Applied Physics, 115 (5). 53525pp. doi:10.1063/1.4864255
Plain TextBommali, R. K., Ghosh, S., Vijaya Prakash, G., Gao, K., Zhou, S., Khan, S. A., Srivastava, P. (2014) Hydrogen plasma induced modification of photoluminescence from a-SiNx:H thin films. Journal of Applied Physics, 115 (5). 53525pp. doi:10.1063/1.4864255
In(2014, February) Journal of Applied Physics Vol. 115 (5) AIP Publishing


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