Kahouli, A., Marichy, C., Sylvestre, A., Pinna, N. (2015) Anomalous C-V response correlated to relaxation processes in TiO2 thin film based-metal-insulator-metal capacitor: Effect of titanium and oxygen defects. Journal of Applied Physics, 117 (15). 154101pp. doi:10.1063/1.4917531
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Anomalous C-V response correlated to relaxation processes in TiO2 thin film based-metal-insulator-metal capacitor: Effect of titanium and oxygen defects | ||
Journal | Journal of Applied Physics | ||
Authors | Kahouli, A. | Author | |
Marichy, C. | Author | ||
Sylvestre, A. | Author | ||
Pinna, N. | Author | ||
Year | 2015 (April 21) | Volume | 117 |
Issue | 15 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4917531Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5200862 | Long-form Identifier | mindat:1:5:5200862:5 |
GUID | 0 | ||
Full Reference | Kahouli, A., Marichy, C., Sylvestre, A., Pinna, N. (2015) Anomalous C-V response correlated to relaxation processes in TiO2 thin film based-metal-insulator-metal capacitor: Effect of titanium and oxygen defects. Journal of Applied Physics, 117 (15). 154101pp. doi:10.1063/1.4917531 | ||
Plain Text | Kahouli, A., Marichy, C., Sylvestre, A., Pinna, N. (2015) Anomalous C-V response correlated to relaxation processes in TiO2 thin film based-metal-insulator-metal capacitor: Effect of titanium and oxygen defects. Journal of Applied Physics, 117 (15). 154101pp. doi:10.1063/1.4917531 | ||
In | (2015, April) Journal of Applied Physics Vol. 117 (15) AIP Publishing |
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