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Ryan, E. Todd, Molis, Steven E. (2017) A plasmaless, photochemical etch process for porous organosilicate glass films. Journal of Applied Physics, 122 (24). 244104pp. doi:10.1063/1.5008388

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Reference TypeJournal (article/letter/editorial)
TitleA plasmaless, photochemical etch process for porous organosilicate glass films
JournalJournal of Applied Physics
AuthorsRyan, E. ToddAuthor
Molis, Steven E.Author
Year2017 (December 28)Volume122
Issue24
PublisherAIP Publishing
DOIdoi:10.1063/1.5008388Search in ResearchGate
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Mindat Ref. ID5208145Long-form Identifiermindat:1:5:5208145:1
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Full ReferenceRyan, E. Todd, Molis, Steven E. (2017) A plasmaless, photochemical etch process for porous organosilicate glass films. Journal of Applied Physics, 122 (24). 244104pp. doi:10.1063/1.5008388
Plain TextRyan, E. Todd, Molis, Steven E. (2017) A plasmaless, photochemical etch process for porous organosilicate glass films. Journal of Applied Physics, 122 (24). 244104pp. doi:10.1063/1.5008388
In(2017, December) Journal of Applied Physics Vol. 122 (24) AIP Publishing

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Zin, Emil H., Bang, W. H., Todd Ryan, E., King, Sean W., Kim, Choong-Un (2013) Study of viscoplastic deformation in porous organosilicate thin films for ultra low-k applications. Applied Physics Letters, 102 (22). 221909pp. doi:10.1063/1.4809827
Ryan, E. Todd, Molis, Steven, Grill, Alfred (2010) Silane Decomposition on Cu Interconnects Inhibited by Ammonia. Journal of the Electrochemical Society, 157. doi:10.1149/1.3253543
Ryan, E. Todd, Gates, Stephen M., Grill, Alfred, Molis, Steven, Flaitz, Philip, Arnold, John, Sankarapandian, Muthumanickam, Cohen, Stephan A., Ostrovski, Yuri, Dimitrakopoulos, Christos (2008) Property modifications of nanoporous pSiCOH dielectrics to enhance resistance to plasma-induced damage. Journal of Applied Physics, 104 (9). 94109pp. doi:10.1063/1.3006438
Ryan, E. Todd, Martin, Jeremy, Junker, Kurt, Wetzel, Jeff, Gidley, David W., Sun, Jianing (2001) Effect of material properties on integration damage in organosilicate glass films. Journal of Materials Research, 16 (12) 3335-3338 doi:10.1557/jmr.2001.0458
Sun, Jia-Ning, Gidley, David W., Hu, Yifan, Frieze, William E., Ryan, E. Todd (2002) Depth-profiling plasma-induced densification of porous low-k thin films using positronium annihilation lifetime spectroscopy. Applied Physics Letters, 81 (8). 1447-1449 doi:10.1063/1.1501767
Ren, H., Antonelli, G. A., Nishi, Y., Shohet, J. L. (2010) Plasma damage effects on low-k porous organosilicate glass. Journal of Applied Physics, 108 (9). 94110pp. doi:10.1063/1.3506523
Guo, X., Jakes, J. E., Banna, S., Nishi, Y., Shohet, J. L. (2014) Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass. Journal of Applied Physics, 116 (4). 44103pp. doi:10.1063/1.4891501
Komandin, Gennadiy A, Nozdrin, Vadim S, Spektor, Igor E, Porodinkov, Oleg E, Seregin, Dmitry S, Vishnevskiy, Alexey S, Vorotilov, Konstantin A, Sigov, Alexander S (2021) Dielectric contribution of the IR absorption bands of porous organosilicate glass thin films on a platinum sublayer. Journal of Physics D: Applied Physics, 54 (21) 215304pp. doi:10.1088/1361-6463/abe897
Sun, Jia-Ning, Gidley, David W., Dull, Terry L., Frieze, William E., Yee, Albert F., Ryan, E. Todd, Lin, Simon, Wetzel, Jeff (2001) Probing diffusion barrier integrity on porous silica low-k thin films using positron annihilation lifetime spectroscopy. Journal of Applied Physics, 89 (9). 5138-5144 doi:10.1063/1.1360704
Murray, Conal E., Bedell, Stephen W., Ryan, E. Todd (2013) Weighted mechanical models for residual stress determination using x-ray diffraction. Journal of Applied Physics, 114 (3). 33518pp. doi:10.1063/1.4813478
Dunce, M., Krieke, G., Birks, E., Bikse, L., Antonova, M., Sarakovskis, A. (2020) The role of structural disorder on luminescence of Eu-doped Na0.5Bi0.5TiO3. Journal of Applied Physics, 128 (24) 244104pp. doi:10.1063/5.0031305
 
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