Sosnowski, Marek, Yamada, Isao (1989) Deposition of thin films of copper on silicon substrates at low temperature by the ICB method. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 874-877 doi:10.1016/0168-583x(89)90318-2
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Deposition of thin films of copper on silicon substrates at low temperature by the ICB method | ||
Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | ||
Authors | Sosnowski, Marek | Author | |
Yamada, Isao | Author | ||
Year | 1989 (February) | Volume | 37 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/0168-583x(89)90318-2Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5592274 | Long-form Identifier | mindat:1:5:5592274:2 |
GUID | 0 | ||
Full Reference | Sosnowski, Marek, Yamada, Isao (1989) Deposition of thin films of copper on silicon substrates at low temperature by the ICB method. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 874-877 doi:10.1016/0168-583x(89)90318-2 | ||
Plain Text | Sosnowski, Marek, Yamada, Isao (1989) Deposition of thin films of copper on silicon substrates at low temperature by the ICB method. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 37. 874-877 doi:10.1016/0168-583x(89)90318-2 | ||
In | (1989) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 37. Elsevier BV |
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