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Tian, Xiubo, Chu, Paul K (2001) Target temperature simulation during fast-pulsing plasma immersion ion implantation. Journal of Physics D: Applied Physics, 34. 1639-1645 doi:10.1088/0022-3727/34/11/313

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Reference TypeJournal (article/letter/editorial)
TitleTarget temperature simulation during fast-pulsing plasma immersion ion implantation
JournalJournal of Physics D: Applied Physics
AuthorsTian, XiuboAuthor
Chu, Paul KAuthor
Year2001 (June 7)Volume34
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/34/11/313Search in ResearchGate
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Mindat Ref. ID5668509Long-form Identifiermindat:1:5:5668509:7
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Full ReferenceTian, Xiubo, Chu, Paul K (2001) Target temperature simulation during fast-pulsing plasma immersion ion implantation. Journal of Physics D: Applied Physics, 34. 1639-1645 doi:10.1088/0022-3727/34/11/313
Plain TextTian, Xiubo, Chu, Paul K (2001) Target temperature simulation during fast-pulsing plasma immersion ion implantation. Journal of Physics D: Applied Physics, 34. 1639-1645 doi:10.1088/0022-3727/34/11/313
In(2000) Journal of Physics D: Applied Physics Vol. 34. IOP Publishing

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Tian, Xiubo, Yang, Shiqin, Huang, Yongxian, Chu, Paul K, Fu, Ricky K Y (2004) Implantation dynamics of plasma implantation into insulating strips. Journal of Physics D: Applied Physics, 37. 50-54 doi:10.1088/0022-3727/37/1/009
Kwok, D T K, Zeng, Z M, Chu, P K, Sheridan, T E (2001) Hybrid simulation of sheath and ion dynamics of plasma implantation into ring-shaped targets. Journal of Physics D: Applied Physics, 34. 1091-1099 doi:10.1088/0022-3727/34/7/311
Tian, Xiubo, Chu, Paul K. (2000) Modeling of the relationship between implantation parameters and implantation dose during plasma immersion ion implantation. Physics Letters A, 277. 42-46 doi:10.1016/s0375-9601(00)00673-3
Bektursunova, Rimma M, Demokan, Ordal (2001) Perturbation analysis of sheath evolution, with application to plasma source ion implantation. Journal of Physics D: Applied Physics, 34. 326-329 doi:10.1088/0022-3727/34/3/313
Tian, Xiubo, Zeng, Zhaoming, Zeng, Xuchu, Tang, Baoyin, Chu, Paul K. (2000) Efficacy of high-frequency, low-voltage plasma immersion ion implantation of a bar-shaped target. Journal of Applied Physics, 88 (5). 2221-2225 doi:10.1063/1.1287221
Tian, Xiubo, Tang, Baoyin, Chu, Paul K. (1999) Accurate determination of pulsed current waveform in plasma immersion ion implantation processes. Journal of Applied Physics, 86 (7). 3567-3570 doi:10.1063/1.371259
Prins, Johan F (2001) Ballistic self-annealing during ion implantation. Journal of Physics D: Applied Physics, 34. 3003-3010 doi:10.1088/0022-3727/34/20/301
Fu, Ricky K. Y., Chu, Paul K., Tian, Xiubo (2004) Influence of thickness and dielectric properties on implantation efficacy in plasma immersion ion implantation of insulators. Journal of Applied Physics, 95 (7). 3319-3323 doi:10.1063/1.1666976
Tian, Xiubo, Chu, Paul K. (2000) Direct temperature monitoring for semiconductors in plasma immersion ion implantation. Review of Scientific Instruments, 71 (7). 2839-2842 doi:10.1063/1.1150700
Kwok, Dixon T K, Hu, Tao, Chu, Paul K (2009) One-step, non-contact pattern transfer by direct-current plasma immersion ion implantation. Journal of Physics D: Applied Physics, 42. 195201pp. doi:10.1088/0022-3727/42/19/195201
Kwok, Dixon T K, Li, Jianhui, Ma, Xiaobo, Chu, Paul K (2010) Hybrid particle-in-cell (PIC) ions and Boltzmann electron distribution simulation of direct-current plasma immersion ion implantation into three-dimensional objects. Journal of Physics D: Applied Physics, 43. 95203pp. doi:10.1088/0022-3727/43/9/095203
 
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