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Lambertz, A., Finger, F., Holländer, B., Rath, J.K., Schropp, R.E.I. (2012) Boron-doped hydrogenated microcrystalline silicon oxide (μc-SiOx:H) for application in thin-film silicon solar cells. Journal of Non-Crystalline Solids, 358 (17) 1962-1965 doi:10.1016/j.jnoncrysol.2011.12.047

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Reference TypeJournal (article/letter/editorial)
TitleBoron-doped hydrogenated microcrystalline silicon oxide (μc-SiOx:H) for application in thin-film silicon solar cells
JournalJournal of Non-Crystalline Solids
AuthorsLambertz, A.Author
Finger, F.Author
Holländer, B.Author
Rath, J.K.Author
Schropp, R.E.I.Author
Year2012 (September)Volume358
Issue17
PublisherElsevier BV
DOIdoi:10.1016/j.jnoncrysol.2011.12.047Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID648717Long-form Identifiermindat:1:5:648717:5
GUID0
Full ReferenceLambertz, A., Finger, F., Holländer, B., Rath, J.K., Schropp, R.E.I. (2012) Boron-doped hydrogenated microcrystalline silicon oxide (μc-SiOx:H) for application in thin-film silicon solar cells. Journal of Non-Crystalline Solids, 358 (17) 1962-1965 doi:10.1016/j.jnoncrysol.2011.12.047
Plain TextLambertz, A., Finger, F., Holländer, B., Rath, J.K., Schropp, R.E.I. (2012) Boron-doped hydrogenated microcrystalline silicon oxide (μc-SiOx:H) for application in thin-film silicon solar cells. Journal of Non-Crystalline Solids, 358 (17) 1962-1965 doi:10.1016/j.jnoncrysol.2011.12.047
In(2012, September) Journal of Non-Crystalline Solids Vol. 358 (17) Elsevier BV

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