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de Almeida, L. A. L., Deep, G. S., Lima, A. M. N., Neff, H. (2000) Thermal dynamics of VO2 films within the metal–insulator transition: Evidence for chaos near percolation threshold. Applied Physics Letters, 77 (26). 4365-4367 doi:10.1063/1.1334917

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Reference TypeJournal (article/letter/editorial)
TitleThermal dynamics of VO2 films within the metal–insulator transition: Evidence for chaos near percolation threshold
JournalApplied Physics Letters
Authorsde Almeida, L. A. L.Author
Deep, G. S.Author
Lima, A. M. N.Author
Neff, H.Author
Year2000 (December 25)Volume77
Issue26
PublisherAIP Publishing
DOIdoi:10.1063/1.1334917Search in ResearchGate
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Mindat Ref. ID8528030Long-form Identifiermindat:1:5:8528030:6
GUID0
Full Referencede Almeida, L. A. L., Deep, G. S., Lima, A. M. N., Neff, H. (2000) Thermal dynamics of VO2 films within the metal–insulator transition: Evidence for chaos near percolation threshold. Applied Physics Letters, 77 (26). 4365-4367 doi:10.1063/1.1334917
Plain Textde Almeida, L. A. L., Deep, G. S., Lima, A. M. N., Neff, H. (2000) Thermal dynamics of VO2 films within the metal–insulator transition: Evidence for chaos near percolation threshold. Applied Physics Letters, 77 (26). 4365-4367 doi:10.1063/1.1334917
In(2000, December) Applied Physics Letters Vol. 77 (26) AIP Publishing

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