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Opila, R. L., Wilk, G. D., Alam, M. A., van Dover, R. B., Busch, B. W. (2002) Photoemission study of Zr- and Hf-silicates for use as high-κ oxides: Role of second nearest neighbors and interface charge. Applied Physics Letters, 81 (10). 1788-1790 doi:10.1063/1.1505120

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Reference TypeJournal (article/letter/editorial)
TitlePhotoemission study of Zr- and Hf-silicates for use as high-κ oxides: Role of second nearest neighbors and interface charge
JournalApplied Physics Letters
AuthorsOpila, R. L.Author
Wilk, G. D.Author
Alam, M. A.Author
van Dover, R. B.Author
Busch, B. W.Author
Year2002 (September 2)Volume81
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.1505120Search in ResearchGate
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Mindat Ref. ID8532954Long-form Identifiermindat:1:5:8532954:4
GUID0
Full ReferenceOpila, R. L., Wilk, G. D., Alam, M. A., van Dover, R. B., Busch, B. W. (2002) Photoemission study of Zr- and Hf-silicates for use as high-κ oxides: Role of second nearest neighbors and interface charge. Applied Physics Letters, 81 (10). 1788-1790 doi:10.1063/1.1505120
Plain TextOpila, R. L., Wilk, G. D., Alam, M. A., van Dover, R. B., Busch, B. W. (2002) Photoemission study of Zr- and Hf-silicates for use as high-κ oxides: Role of second nearest neighbors and interface charge. Applied Physics Letters, 81 (10). 1788-1790 doi:10.1063/1.1505120
In(2002, September) Applied Physics Letters Vol. 81 (10) AIP Publishing

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