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De Keyser, K., Detavernier, C., Van Meirhaeghe, R. L. (2007) Characterization of the texture of silicide films using electron backscattered diffraction. Applied Physics Letters, 90 (12). 121920pp. doi:10.1063/1.2716362

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization of the texture of silicide films using electron backscattered diffraction
JournalApplied Physics Letters
AuthorsDe Keyser, K.Author
Detavernier, C.Author
Van Meirhaeghe, R. L.Author
Year2007 (March 19)Volume90
Issue12
PublisherAIP Publishing
DOIdoi:10.1063/1.2716362Search in ResearchGate
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Mindat Ref. ID8553057Long-form Identifiermindat:1:5:8553057:5
GUID0
Full ReferenceDe Keyser, K., Detavernier, C., Van Meirhaeghe, R. L. (2007) Characterization of the texture of silicide films using electron backscattered diffraction. Applied Physics Letters, 90 (12). 121920pp. doi:10.1063/1.2716362
Plain TextDe Keyser, K., Detavernier, C., Van Meirhaeghe, R. L. (2007) Characterization of the texture of silicide films using electron backscattered diffraction. Applied Physics Letters, 90 (12). 121920pp. doi:10.1063/1.2716362
In(2007, March) Applied Physics Letters Vol. 90 (12) AIP Publishing

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Van Bockstael, C., De Keyser, K., Van Meirhaeghe, R. L., Detavernier, C., Jordan-Sweet, J. L., Lavoie, C. (2009) Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films. Applied Physics Letters, 94 (3). 33504pp. doi:10.1063/1.3073750
Van Bockstael, C., De Keyser, K., Deduytsche, D., Van Meirhaeghe, R. L., Detavernier, C., Jordan-Sweet, J. L., Lavoie, C. (2008) Effect of Pt addition on growth stress and thermal stress of NiSi films. Journal of Applied Physics, 104 (5). 53510pp. doi:10.1063/1.2973679
De Keyser, K., Van Bockstael, C., Van Meirhaeghe, R. L., Detavernier, C., Verleysen, E., Bender, H., Vandervorst, W., Jordan-Sweet, J., Lavoie, C. (2010) Phase formation and thermal stability of ultrathin nickel-silicides on Si(100). Applied Physics Letters, 96 (17). 173503pp. doi:10.1063/1.3384997
Detavernier, C., Deduytsche, D., Van Meirhaeghe, R. L., De Baerdemaeker, J., Dauwe, C. (2003) Room-temperature grain growth in sputter-deposited Cu films. Applied Physics Letters, 82 (12). 1863-1865 doi:10.1063/1.1563048
Opsomer, K., Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Lauwers, A., Maex, K., Lavoie, C. (2007) Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions. Applied Physics Letters, 90 (3). 31906pp. doi:10.1063/1.2431781
De Keyser, K., Van Meirhaeghe, R. L., Detavernier, C., Jordan-Sweet, J., Lavoie, C. (2010) Texture of Cobalt Germanides on Ge(100) and Ge(111) and Its Influence on the Formation Temperature. Journal of the Electrochemical Society, 157. doi:10.1149/1.3294702
Van Bockstael, C., Detavernier, C., Van Meirhaeghe, R. L., Jordan-Sweet, J. L., Lavoie, C. (2009) In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers. Journal of Applied Physics, 106 (6). 64515pp. doi:10.1063/1.3194318
Detavernier, C., Van Meirhaeghe, R. L., Cardon, F., Donaton, R. A., Maex, K. (1999) CoSi2 formation in the presence of interfacial silicon oxide. Applied Physics Letters, 74 (20). 2930-2932 doi:10.1063/1.123969
Detavernier, C., Van Meirhaeghe, R. L., Cardon, F., Maex, K., Vandervorst, W., Brijs, B. (2000) Influence of Ti on CoSi2 nucleation. Applied Physics Letters, 77 (20). 3170-3172 doi:10.1063/1.1325401
Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Lavoie, C. (2005) High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation. Journal of Applied Physics, 98 (3). 33526pp. doi:10.1063/1.2005380
Smeets, D., Vantomme, A., De Keyser, K., Detavernier, C., Lavoie, C. (2008) The role of lattice mismatch and kinetics in texture development: Co1−xNixSi2 thin films on Si(100). Journal of Applied Physics, 103 (6). 63506pp. doi:10.1063/1.2888554
 
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